Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARL | Q9H300 | 3/20 | 0.62 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.49 |
| ▸ | MAPT | P10636 | 5/20 | 0.49 |
| ▸ | F2 | P00734 | 3/20 | 0.49 |
| ▸ | HTT | P42858 | 2/20 | 0.49 |
| ▸ | XBP1 | P17861 | 2/20 | 0.49 |
| ▸ | HPGD | P15428 | 3/20 | 0.48 |
| ▸ | MEN1 | O00255 | 3/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | VDR | P11473 | 1/20 | 0.44 |
| ▸ | ESR1 | P03372 | 2/20 | 0.42 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | CTSG | P08311 | 1/20 | 0.42 |
| ▸ | CMA1 | P23946 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31314906 | 0.81 | KMT2A (0.50) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL2958322 | 0.81 | ALDH1A1 (0.65) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL7784307 | 0.80 | KDM4E (0.73) | KDM4EALDH1A1KMT2AMAPTF2 | |
| SCHEMBL8702851 | 0.78 | KMT2A (0.42) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL7973267 | 0.78 | PARL (0.65) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL65216 | 0.78 | PARL (0.58) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL7161148 | 0.78 | PARL (0.58) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL64964 | 0.77 | PARL (1.00) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL29369615 | 0.76 | PARL (0.57) | PARLKDM4EALDH1A1KMT2AMAPT | |
| SCHEMBL452741 | 0.76 | PARL (0.57) | PARLKDM4EALDH1A1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109843935-B | Dispersion liquid | 住友化学株式会社 | 2021-07-27 | — | — | CN | disclosed |
| EP-2907156-A1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | Canon Kabushiki Kaisha (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2847233-A1 | CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | Canon Kabushiki Kaisha (JP) | 2015-03-18 | — | — | EP | disclosed |
| EP-2841255-A1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | Canon Kabushiki Kaisha (JP) | 2015-03-04 | — | — | EP | disclosed |
| EP-2791965-A1 | PHOTOCURED PRODUCT AND METHOD FOR PRODUCING THE SAME | Canon Kabushiki Kaisha (JP) | 2014-10-22 | — | — | EP | disclosed |
| WO-2014084395-A1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | CANON KABUSHIKI KAISHA (JP) | 2014-06-05 | — | — | WO | disclosed |
| WO-2014017505-A1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KABUSHIKI KAISHA (JP) | 2014-01-30 | — | — | WO | disclosed |
| WO-2013183467-A1 | CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KABUSHIKI KAISHA (JP) | 2013-12-12 | — | — | WO | disclosed |
| WO-2013118791-A1 | PHOTOCURED PRODUCT AND METHOD FOR PRODUCING THE SAME | CANON KABUSHIKI KAISHA (JP) | 2013-08-15 | — | — | WO | disclosed |
| US-7759045-B2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-07-20 | — | — | US | disclosed |
| US-7534547-B2 | Optically active compound and photosensitive resin composition | OSAKA GAS COMPANY LIMITED (JP) | 2009-05-19 | — | — | US | disclosed |
| US-20090004601-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-01-01 | — | — | US | disclosed |
| US-6921623-B2 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2005-07-26 | — | — | US | disclosed |
| EP-1375463-A1 | OPTICALLY ACTIVE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION | Kansai Research Institute, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | KRI, INC. (JP) | 2003-11-13 | — | — | US | disclosed |
| US-20030064320-A1 | Active components and photosensitive resin composition containing the same | KRI, INC. (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1265103-A1 | ACTIVE COMPONENTS AND PHOTOSENSITIVE RESIN COMPOSITIONS CONTAINING THE SAME | Kansai Research Institute, Inc. (JP) | 2002-12-11 | — | — | EP | disclosed |
| US-6068962-A | NOVOLAK RESIN AS AN ALKALI-SOLUBLE COMPONENT; QUINONEDIAZIDE; ACID GENERATOR; ANTHRACENE DERIVATIVE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-05-30 | — | — | US | disclosed |
| EP-0831371-A2 | Positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-03-25 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030211421-A1 | Optically active compound and photosensitive resin composition | ARCN1, RAD51, PAM | PARL 1844/4885KDM4E 1317/4885ALDH1A1 1552/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.