SCHEMBL2797601

SCHEMBL2797601

CCOC(=O)C1(CCCn2c(=O)ccc3ccc(OC)cc32)CCN(CCSc2cccs2)CC1

nearest known ligand 0.42

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 9/20 0.42
KMT2A Q03164 9/20 0.42
POLB P06746 3/20 0.42
KCNH2 Q12809 5/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
KDM4E B2RXH2 1/20 0.39
LMNA P02545 1/20 0.37
MAPK1 P28482 1/20 0.37
HTT P42858 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12000061 0.92 KDM4E (0.38) MEN1KMT2AL3MBTL1KDM4ELMNA
SCHEMBL2797961 0.91 KCNH2 (0.41) KCNH2
SCHEMBL2799830 0.90 MEN1 (0.41) MEN1KMT2APOLBKCNH2L3MBTL1
SCHEMBL12002168 0.89 KCNH2 (0.46) MEN1KMT2APOLBKCNH2
SCHEMBL2797883 0.88 POLB (0.49) MEN1KMT2APOLBL3MBTL1KDM4E
SCHEMBL4136776 0.87 KDM4E (0.40) MEN1KMT2AL3MBTL1KDM4ELMNA
SCHEMBL12002303 0.85 KCNH2 (0.37) KCNH2
SCHEMBL2796445 0.85 POLB (0.45) MEN1KMT2APOLBL3MBTL1LMNA
SCHEMBL4136902 0.84 ALDH1A1 (0.41) MEN1KMT2AL3MBTL1KDM4EMAPK1
SCHEMBL12000067 0.82 KCNH2 (0.33) KMT2AKCNH2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8524738-B2 Quinolinones and quinoxalinones as antibacterial composition TOYAMA CHEMICAL CO., LTD. (JP) 2013-09-03 US disclosed
US-8524738-B2 Quinolinones and quinoxalinones as antibacterial composition TOYAMA CHEMICAL CO., LTD. (JP) 2013-09-03 US disclosed
US-8329694-B2 Quinoxalinones as antibacterial composition TOYAMA CHEMICAL CO., LTD. (JP) 2012-12-11 US disclosed
US-8329694-B2 Quinoxalinones as antibacterial composition TOYAMA CHEMICAL CO., LTD. (JP) 2012-12-11 US disclosed
US-20120214990-A1 QUINOLINONES AND QUINOXALINONES AS ANTIBACTERIAL COMPOSITION TAISHO PHARMACEUTICAL CO., LTD. (JP) 2012-08-23 US disclosed
US-20120210937-A1 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER APPLIED MATERIALS, INC. (US) 2012-08-23 US disclosed
EP-2468743-A1 Nitrogen-containing bicyclic compounds useful as antibacterial agents Toyama Chemical Co., Ltd. (JP) 2012-06-27 EP disclosed
CN-101061253-B Substrate processing apparatus using batch processing chamber APPLIED MATERIALS INC 2010-12-22 CN disclosed
US-20100173495-A1 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER APPLIED MATERIALS, INC. 2010-07-08 US disclosed
US-20100168418-A1 NOVEL NITROGENATED HETEROCYCLIC COMPOUND AND SALT THEREOF TOYAMA CHEMICAL CO., LTD. (JP) 2010-07-01 US disclosed
EP-1900732-A1 NOVEL NITROGENATED HETEROCYCLIC COMPOUND AND SALT THEREOF TOYAMA CHEMICAL CO., LTD. (JP) 2008-03-19 EP disclosed
CN-101061253-A Substrate processing apparatus using batch processing chamber APPLIED MATERIALS INC (US) 2007-10-24 CN disclosed
US-7279392-B2 Thin film structure, capacitor, and methods for forming the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-10-09 US disclosed
EP-1824960-A2 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER Applied Materials, Inc. (US) 2007-08-29 EP disclosed
US-7151039-B2 Method of forming oxide layer using atomic layer deposition method and method of forming capacitor of semiconductor device using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2006-12-19 US disclosed
US-20060156979-A1 Substrate processing apparatus using a batch processing chamber APPLIED MATERIALS, INC. 2006-07-20 US disclosed
WO-2006055984-A2 SUBSTRATE PROCESSING APPARATUS USING A BATCH PROCESSING CHAMBER APPLIED MATERIALS, INC. (US) 2006-05-26 WO disclosed
US-20050170566-A1 Thin film structure, capacitor, and methods for forming the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-08-04 US disclosed
US-20050170601-A1 Methods of forming dielectric structures and capacitors SAMSUNG ELECTRONICS CO., LTD. (KR) 2005-08-04 US disclosed
US-20040033698-A1 Method of forming oxide layer using atomic layer deposition method and method of forming capacitor of semiconductor device using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2004-02-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100168418-A1 NOVEL NITROGENATED HETEROCYCLIC COMPOUND AND SALT THEREOF ROS1, NOX1, ARG1 MEN1 1971/4885KMT2A 1173/4885POLB 2770/4885
US-20120214990-A1 QUINOLINONES AND QUINOXALINONES AS ANTIBACTERIAL COMPOSITION NQO2, ASNS, NDUFS1 MEN1 2461/4885KMT2A 2354/4885POLB 314/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.