SCHEMBL27985162

SCHEMBL27985162

COC(N)c1cc(C)ccc1O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.45
ALOX15 P16050 2/20 0.45
HSD17B10 Q99714 2/20 0.45
TRPA1 O75762 2/20 0.45
TP53 P04637 2/20 0.43
TDP1 Q9NUW8 2/20 0.43
LMNA P02545 4/20 0.42
CHRM1 P11229 2/20 0.42
ADRA1A P35348 2/20 0.42
SLC6A2 P23975 1/20 0.42
HTR2B P41595 1/20 0.42
MAPT P10636 3/20 0.39
HPGD P15428 3/20 0.39
KMT2A Q03164 3/20 0.39
MEN1 O00255 2/20 0.39
GAA P10253 2/20 0.39
ALOX12 P18054 1/20 0.39
ESR1 P03372 1/20 0.38
CHRM2 P08172 1/20 0.38
CHRM4 P08173 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28276798 0.80 TRPA1 (0.48) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL9198019 0.78 LMNA (0.52) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL4624079 0.76 TRPA1 (0.43) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL13257345 0.74 TRPA1 (0.56) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL28565022 0.74 TRPA1 (0.50) ALDH1A1ALOX15HSD17B10TRPA1TP53
Isothymol SCHEMBL852892 0.73 LMNA (0.68) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL50784 0.73 LMNA (0.56) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL30631004 0.73 TRPA1 (0.54) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL218020 0.73 TRPA1 (0.54) ALDH1A1ALOX15HSD17B10TRPA1TP53
SCHEMBL27562673 0.73 TRPA1 (0.54) ALDH1A1ALOX15HSD17B10TRPA1TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102725694-B Photosensitive polymer composition, method for producing pattern, and electronic component HITACHI CHEM DUPONT MICROSYS 2015-05-27 CN disclosed
CN-102713756-B Light-sensitive polymer composition, method for producing pattern, and electronic component HITACHI CHEMICAL DUPONT MICROSYSTEMS, LTD. (JP) 2014-10-15 CN disclosed