Methyl Alcohol

Methyl Alcohol

SCHEMBL28005405

CO.O=[N+]([O-])c1ccc2ccccc2c1

nearest known ligand 0.52

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.52
KMT2A Q03164 5/20 0.52
MAPT P10636 4/20 0.52
ALPG P10696 1/20 0.52
RAB9A P51151 2/20 0.51
NPC1 O15118 1/20 0.51
MAOA P21397 1/20 0.51
MAOB P27338 1/20 0.51
TSHR P16473 5/20 0.50
LMNA P02545 3/20 0.50
TDP1 Q9NUW8 2/20 0.50
ALDH1A1 P00352 7/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
CYP19A1 P11511 2/20 0.47
ACHE P22303 2/20 0.47
ALOX15 P16050 1/20 0.47
IKBKB O14920 1/20 0.47
PTPRC P08575 2/20 0.46
BCHE P06276 1/20 0.46
CES1 P23141 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL57616 0.94 LMNA (0.56) MEN1KMT2AMAPTALPGRAB9A
SCHEMBL29929890 0.94 LMNA (0.56) MEN1KMT2AMAPTALPGRAB9A
SCHEMBL31677837 0.88 LMNA (0.54) MEN1KMT2AMAPTALPGRAB9A
SCHEMBL2760792 0.88 LMNA (0.54) MEN1KMT2AMAPTALPGRAB9A
SCHEMBL5167846 0.88 LMNA (0.54) MEN1KMT2AMAPTALPGRAB9A
SCHEMBL28122579 0.85 TSHR (0.59) MAPTMAOBTSHRLMNATDP1
SCHEMBL28688755 0.85 TSHR (0.47) MEN1KMT2AMAPTALPGRAB9A
SCHEMBL3829978 0.83 TSHR (0.56) MAPTMAOBTSHRLMNATDP1
SCHEMBL28338203 0.81 TSHR (0.54) MAPTMAOBTSHRLMNATDP1
Cadaverine Tartrate SCHEMBL9102669 0.80 MEN1 (0.46) MEN1KMT2AMAPTALPGRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104570608-B Conformal photosensitive resin composition, photosensitive resin film and display device using its preparation 第毛织株式会社 2018-12-21 CN disclosed
CN-104570608-A Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device CHEIL IND INC 2015-04-29 CN disclosed