Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CNR1 | P21554 | 1/20 | 0.45 |
| ▸ | OPRM1 | P35372 | 4/20 | 0.42 |
| ▸ | OPRD1 | P41143 | 4/20 | 0.42 |
| ▸ | OPRK1 | P41145 | 4/20 | 0.42 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.42 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | GAA | P10253 | 1/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | NOS1 | P29475 | 2/20 | 0.38 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.36 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.36 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.36 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.36 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.36 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.36 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24300105 | 0.91 | OPRM1 (0.45) | CNR1OPRM1OPRD1OPRK1HDAC1 | |
| SCHEMBL22388176 | 0.78 | OPRM1 (0.46) | OPRM1OPRD1OPRK1NOS1 | |
| Formic Acid SCHEMBL27462317 | 0.77 | SMN1; SMN2 (0.53) | OPRK1ALDH1A1KMT2ATSHRSMN1; SMN2 | |
| SCHEMBL13680779 | 0.76 | CNR1 (0.44) | CNR1HDAC1HDAC6ALDH1A1GAA | |
| SCHEMBL9579004 | 0.74 | OPRM1 (0.50) | OPRM1OPRD1OPRK1KMT2ANOS1 | |
| SCHEMBL834162 | 0.73 | ALDH1A1 (0.50) | CNR1HDAC1HDAC6ALDH1A1GAA | |
| SCHEMBL1295097 | 0.73 | HDAC1 (0.46) | CNR1HDAC1HDAC6ALDH1A1GAA | |
| SCHEMBL13154972 | 0.73 | ALDH1A1 (0.45) | CNR1HDAC1HDAC6ALDH1A1GAA | |
| SCHEMBL17103311 | 0.72 | MAOA (0.42) | OPRM1OPRD1OPRK1ALDH1A1 | |
| SCHEMBL5775566 | 0.72 | ALDH1A1 (0.48) | CNR1HDAC1HDAC6ALDH1A1GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 70 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104749884-B | Photosensitive polymer combination | 东京应化工业株式会社 | 2019-10-18 | — | — | CN | disclosed |
| CN-109962089-A | The manufacturing method of wavelength convert substrate | 东京应化工业株式会社 | 2019-07-02 | — | — | CN | disclosed |
| CN-109765754-A | Solidification compound, cured film forming method, solidfied material, the cured film and transparent optical component being patterned | 东京应化工业株式会社 | 2019-05-17 | — | — | CN | disclosed |
| CN-109557765-A | Photosensitive polymer combination, cured film, display device and pattern forming method | 东京应化工业株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-104371372-B | Dispersible pigment dispersion, photosensitive polymer combination and dispersing aid containing the dispersible pigment dispersion | 东京应化工业株式会社 | 2019-03-19 | — | — | CN | disclosed |
| CN-109471330-A | Photosensitive composite and Photoepolymerizationinitiater initiater used in it | 东京应化工业株式会社 | 2019-03-15 | — | — | CN | disclosed |
| CN-103365087-B | Insulating film forms the forming method with photosensitive polymer combination, insulating film and insulating film | 东京应化工业株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-104909581-B | It is used to form the pre-treating method of the glass substrate of etching mask | 东京应化工业株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-109426079-A | Photosensitive composite, solidfied material forming method, solidfied material, device used for image display panel and image display device | 东京应化工业株式会社 | 2019-03-05 | — | — | CN | disclosed |
| CN-109283792-A | Photosensitive composite, pattern forming method, solidfied material and display device | 东京应化工业株式会社 | 2019-01-29 | — | — | CN | disclosed |
| CN-101093356-A | Photosensitive polymer combination and liquid crystal tropism control cam and forming method thereof | TOKYO OHKA KOGYO CO LTD (JP) | 2007-12-26 | — | — | CN | disclosed |
| CN-101093321-A | Photosensitive polymer combination and liquid crystal tropism control cam using same | TOKYO OHKA KOGYO CO LTD (JP) | 2007-12-26 | — | — | CN | disclosed |
| CN-101093357-A | Photosensitive polymer combination and liquid crystal tropism control cam using same | TOKYO OHKA KOGYO CO LTD (JP) | 2007-12-26 | — | — | CN | disclosed |
| CN-101093261-A | Black combination, baffle plate and filter for ink-injection type filter | TOKYO OHKA KOGYO CO LTD (JP) | 2007-12-26 | — | — | CN | disclosed |
| CN-101038437-A | Black photosensitive composition, shielding film and el device manufactured by the black photosensitive composition | TOKYO OHKA KOGYO CO LTD (JP) | 2007-09-19 | — | — | CN | disclosed |
| CN-101038438-A | Black photosensitive composition | TOKYO OHKA KOGYO CO LTD (JP) | 2007-09-19 | — | — | CN | disclosed |
| CN-101004560-A | Detergent composition | TOKYO OHKA KOGYO CO LTD (JP) | 2007-07-25 | — | — | CN | disclosed |
| CN-1869816-A | Photosensitive composition and color filter formed thereof | TOKYO OHKA KOGYO CO LTD (JP) | 2006-11-29 | — | — | CN | disclosed |
| CN-1782874-A | Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition | TOKYO APPLIED CHEMICAL INDUSTR (JP) | 2006-06-07 | — | — | CN | disclosed |
| CN-1770013-A | Photosensitive composition for shading-film forming and black matrix formed therefrom | TOKYO OHKA KOGYO CO LTD (JP) | 2006-05-10 | — | — | CN | disclosed |