Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 6/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | TP53 | P04637 | 3/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 2/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28007306 | 0.92 | TSHR (0.46) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL27465283 | 0.83 | TSHR (0.52) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL21995155 | 0.79 | TSHR (0.41) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Methyl Ester SCHEMBL28099897 | 0.76 | TSHR (0.39) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL6266348 | 0.76 | TSHR (0.48) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL3793027 | 0.76 | TSHR (0.48) | TSHRHPGDALDH1A1TP53HIF1A | |
| Hydrochloric Acid SCHEMBL9751739 | 0.75 | TSHR (0.41) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL27940506 | 0.75 | TSHR (0.67) | TSHRHPGDALDH1A1TP53HIF1A | |
| Potassium Ion SCHEMBL9117014 | 0.74 | TSHR (0.47) | TSHRHPGDALDH1A1TP53HIF1A | |
| SCHEMBL8943038 | 0.74 | ALDH1A1 (0.48) | TSHRALDH1A1THRBCYP2D6CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101495919-B | Positive photosensitive resin composition, method for preparing cured relief pattern, semiconductor device | ASAHI KASEI E MATERIALS CORP | 2015-05-06 | — | — | CN | disclosed |