SCHEMBL28016011

SCHEMBL28016011

CC(=O)OCC(C)(C)C(N)=O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.40
LMNA P02545 4/20 0.40
HSD17B10 Q99714 3/20 0.40
ALOX15 P16050 3/20 0.33
CHRM5 P08912 2/20 0.33
CHRM1 P11229 2/20 0.33
CHRM3 P20309 2/20 0.33
GAA P10253 2/20 0.33
BLM P54132 2/20 0.33
PMP22 Q01453 2/20 0.33
PGR P06401 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
HTR1A P08908 1/20 0.33
CHRNB2 P17787 1/20 0.33
TBXA2R P21731 1/20 0.33
CHRNB4 P30926 1/20 0.33
CHRNA3 P32297 1/20 0.33
CHRNA7 P36544 1/20 0.33
CHRNA4 P43681 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6128464 0.80 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL22956117 0.79 PRKCA (0.38) ALDH1A1LMNAHSD17B10ALOX15GAA
SCHEMBL22340346 0.78 LMNA (0.34) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL247442 0.78 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL3481452 0.78 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10CHRM5CHRM1
Hydrochloric Acid SCHEMBL9126771 0.76 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL11757494 0.76 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL1267156 0.76 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL23336886 0.76 ALDH1A1 (0.36) ALDH1A1LMNAHSD17B10CHRM5CHRM1
SCHEMBL11067388 0.75 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10ALOX15CHRM5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101689412-B Insulating film material, multi-layer wire substrate and manufacture method thereof and semiconductor device and manufacture method thereof FUJITSU LTD. (JP) 2015-10-14 CN disclosed