SCHEMBL28026476

SCHEMBL28026476

CCCCC(=[NH+][O-])c1cccc(CN)c1

nearest known ligand 0.45

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
▸ LOXL2 Q9Y4K0 3/20 0.45
▸ ENPP2 Q13822 1/20 0.39
▸ CES2 O00748 2/20 0.37
▸ CES1 P23141 2/20 0.37
▸ NOS1 P29475 4/20 0.36
▸ NOS2 P35228 4/20 0.36
▸ ALDH1A1 P00352 2/20 0.36
▸ NOS3 P29474 2/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ CYP3A4 P08684 1/20 0.36
▸ NFKB1 P19838 1/20 0.36
▸ PNMT P11086 1/20 0.35
▸ PTGS2 P35354 1/20 0.35
▸ ESR1 P03372 1/20 0.34
▸ TLR8 Q9NR97 2/20 0.33
▸ CFD P00746 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27819285 0.84 ABAT (0.39) LOXL2CES2CES1ALDH1A1CYP3A4
SCHEMBL39274 0.77 CES2 (0.55) CES2CES1ALDH1A1PTGS2ESR1
SCHEMBL27819250 0.73 HDAC1 (0.47) CES2CES1ALDH1A1SMN1; SMN2PTGS2
SCHEMBL8412560 0.71 CES2 (0.57) CES2CES1PTGS2ESR1
SCHEMBL3734266 0.71 HSD17B3 (0.56) ALDH1A1SMN1; SMN2CYP3A4PTGS2ESR1
SCHEMBL27652384 0.70 LOXL2 (0.61) LOXL2ENPP2NOS1NOS2ALDH1A1
SCHEMBL28027049 0.70 CES2 (0.36) CES2CES1ALDH1A1CYP3A4PNMT
Hydrochloric Acid SCHEMBL13570501 0.69 LOXL2 (0.57) LOXL2ENPP2CES2CES1NOS1
SCHEMBL18736490 0.69 SMN1; SMN2 (0.57) LOXL2ALDH1A1SMN1; SMN2CFD
SCHEMBL27798187 0.68 HDAC3 (0.41) CES2CES1ALDH1A1ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104910051-A Nitrone-substituted sulfonylarylamine derivative and preparation method thereof UNIV ZHENGZHOU 2015-09-16 — — CN disclosed
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