SCHEMBL28029409

SCHEMBL28029409

C=CC(=O)OCC(C)COC(=O)CCCCC(=O)O

nearest known ligand 0.51

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.51
MAPT P10636 2/20 0.45
HPGD P15428 1/20 0.39
ALDH1A1 P00352 2/20 0.38
CYP3A4 P08684 2/20 0.38
LMNA P02545 2/20 0.37
ATM Q13315 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
ABCC4 O15439 1/20 0.37
PAM P19021 2/20 0.37
KDM4E B2RXH2 1/20 0.36
DUSP3 P51452 1/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
PRKCA P17252 1/20 0.35
PRKCE Q02156 1/20 0.35
PRKCQ Q04759 1/20 0.35
PRKCD Q05655 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10168232 0.90 TSHR (0.55) TSHRMAPTHPGDALDH1A1CYP3A4
SCHEMBL27641860 0.88 TSHR (0.42) TSHRMAPTHPGDALDH1A1CYP3A4
SCHEMBL28655095 0.87 TSHR (0.62) TSHRMAPTHPGDALDH1A1CYP3A4
SCHEMBL536470 0.87 MAPT (0.52) TSHRMAPTALDH1A1CYP3A4LMNA
SCHEMBL28264236 0.84 TSHR (0.55) TSHRMAPTHPGDALDH1A1CYP3A4
SCHEMBL27641861 0.83 TSHR (0.46) TSHRMAPTALDH1A1CYP3A4LMNA
SCHEMBL8965855 0.81 TSHR (0.75) TSHRHPGDALDH1A1CYP3A4
SCHEMBL7761791 0.80 TSHR (0.46) TSHRMAPTHPGDALDH1A1CYP3A4
SCHEMBL7161127 0.79 TSHR (0.39) TSHRMAPTALDH1A1CYP3A4LMNA
SCHEMBL19845035 0.79 TSHR (0.47) TSHRMAPTHPGDALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105175315-B Photo-corrosion-resisting agent composition 巴斯夫欧洲公司 2018-08-28 CN disclosed
CN-103153952-B The oxime ester derivative of benzo carbazole compound and in photopolymerisable compositions as the purposes of photoinitiator 巴斯夫欧洲公司 2016-07-13 CN disclosed
CN-105175315-A Photoresist composition BASF SE 2015-12-23 CN disclosed
CN-102361896-B Photoresist composition BASF SE (DE) 2015-10-07 CN disclosed