SCHEMBL28032429

SCHEMBL28032429

C=CC(=O)N(CCCC)C(C)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ZDHHC20 Q5W0Z9 3/20 0.41
ZDHHC2 Q9UIJ5 2/20 0.41
TSHR P16473 3/20 0.36
HPGD P15428 1/20 0.36
CA12 O43570 2/20 0.34
CA1 P00915 2/20 0.34
CA9 Q16790 2/20 0.34
EPHX2 P34913 1/20 0.34
FAAH O00519 2/20 0.33
MAPT P10636 2/20 0.33
MMP1 P03956 1/20 0.32
MMP2 P08253 1/20 0.32
MMP3 P08254 1/20 0.32
MMP8 P22894 1/20 0.32
MEN1 O00255 1/20 0.32
MAPK1 P28482 1/20 0.32
KMT2A Q03164 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.31
ALDH1A1 P00352 2/20 0.31
THRA P10827 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL799415 0.84 ZDHHC20 (0.41) ZDHHC20ZDHHC2TSHRHPGDCA12
SCHEMBL8946784 0.82 ZDHHC20 (0.40) ZDHHC20ZDHHC2TSHRHPGDCA12
SCHEMBL1881902 0.80 TSHR (0.36) ZDHHC20ZDHHC2TSHRALDH1A1
SCHEMBL28073684 0.80 ZDHHC20 (0.51) ZDHHC20ZDHHC2TSHRHPGDEPHX2
SCHEMBL15280053 0.80 MMP1 (0.40) ZDHHC20ZDHHC2TSHRHPGDMMP1
SCHEMBL10477081 0.78 TSHR (0.46) ZDHHC20ZDHHC2TSHRHPGDEPHX2
SCHEMBL20126073 0.78 TSHR (0.39) ZDHHC20ZDHHC2TSHRHPGDCA1
SCHEMBL9015327 0.78 TSHR (0.42) ZDHHC20ZDHHC2TSHRHPGDMAPT
SCHEMBL20126011 0.78 TSHR (0.39) ZDHHC20ZDHHC2TSHRHPGDCA12
SCHEMBL20126031 0.77 TSHR (0.41) ZDHHC20ZDHHC2TSHRHPGDEPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105264647-A Composition for silicon wafer polishing FUJIMI INC 2016-01-20 CN disclosed
CN-105073941-A Polishing composition and method for manufacturing polished article FUJIMI INC 2015-11-18 CN disclosed
CN-104995277-A POLISHING COMPOSITION, PRODUCTION METHOD FOR POLISHING COMPOSITION, AND PRODUCTION METHOD FOR POLISHED ARTICLE FUJIMI INC 2015-10-21 CN disclosed