SCHEMBL28033539

SCHEMBL28033539

BrCCc1ccc(-c2nc(-c3ccc(CCBr)cc3)nc(-c3ccc(CCBr)cc3)n2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.48
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
SIRT2 Q8IXJ6 7/20 0.37
GFER P55789 1/20 0.35
ADRB2 P07550 1/20 0.34
ALDH1A1 P00352 3/20 0.33
MAPT P10636 3/20 0.33
RAB9A P51151 3/20 0.33
SMN1; SMN2 Q16637 2/20 0.33
HPGD P15428 2/20 0.33
NPC1 O15118 2/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
KDM4E B2RXH2 1/20 0.33
USP2 O75604 1/20 0.33
GAA P10253 1/20 0.33
HSD17B10 Q99714 1/20 0.33
HRH3 Q9Y5N1 1/20 0.33
NFKB1 P19838 1/20 0.33
S1PR1 P21453 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9553181 0.82 TDP1 (0.60) TDP1MEN1KMT2AGFERHRH3
SCHEMBL9510154 0.82 TDP1 (0.60) TDP1MEN1KMT2AGFERHRH3
SCHEMBL21959073 0.80 ALDH1A1 (0.43) MEN1KMT2ASIRT2ADRB2ALDH1A1
Water SCHEMBL11482042 0.79 TDP1 (0.57) TDP1MEN1KMT2AGFERHSD17B10
SCHEMBL2281085 0.79 TDP1 (0.71) TDP1MEN1KMT2AGFERALDH1A1
SCHEMBL21887379 0.76 NISCH (0.47) MEN1KMT2AGFERALDH1A1MAPT
SCHEMBL22874285 0.76 HRH3 (0.38) MEN1KMT2AGFERADRB2ALDH1A1
SCHEMBL30932186 0.76 TDP1 (0.67) TDP1MEN1KMT2AGFERCYP1A2
SCHEMBL2161829 0.73 TDP1 (0.71) TDP1ALDH1A1GAA
SCHEMBL13539887 0.73 RAB9A (0.57) MEN1KMT2AALDH1A1MAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103193764-B A kind of water miscible small molecules pyridinium salt photoelectric material, preparation method and application SOUTH CHINA UNIVERSITY OF TECHNOLOGY (CN) 2015-12-02 CN disclosed