Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALPG | P10696 | 2/20 | 0.36 |
| ▸ | PLAA | Q9Y263 | 1/20 | 0.36 |
| ▸ | ALPL | P05186 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA3 | P07451 | 1/20 | 0.33 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | CA6 | P23280 | 1/20 | 0.33 |
| ▸ | CA5A | P35218 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
| ▸ | FDPS | P14324 | 1/20 | 0.33 |
| ▸ | PDE4A | P27815 | 1/20 | 0.32 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27364542 | 0.74 | LMNA (0.41) | ALPGPLAAALPLTSHRMAPK1 | |
| SCHEMBL19511776 | 0.71 | — | — | |
| SCHEMBL15253670 | 0.71 | BUB1 (0.39) | ALPGPLAAALPLTSHR | |
| SCHEMBL28436055 | 0.70 | ALDH1A1 (0.39) | ALPGPLAAALPLTSHRMAPK1 | |
| SCHEMBL17255834 | 0.69 | ALPG (0.35) | ALPGPLAAALPLTSHRMAPK1 | |
| SCHEMBL5657818 | 0.68 | PDE4A (0.36) | ALPGPLAAFDPSPDE4APDE4B | |
| SCHEMBL27729155 | 0.67 | TLR8 (0.33) | ALPGPLAAALPLTSHRMAPK1 | |
| SCHEMBL1875073 | 0.67 | — | — | |
| SCHEMBL1165647 | 0.66 | ALPG (0.42) | ALPGPLAAALPLTSHRCA12 | |
| SCHEMBL2288576 | 0.66 | ALPG (0.42) | ALPGPLAAALPLTSHRCA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106632921-B | Block copolymer and pattern treatment compositions and method | 罗门哈斯电子材料有限责任公司 | 2019-08-20 | — | — | CN | disclosed |
| CN-106243514-B | Composition and method for pattern processing | 罗门哈斯电子材料有限责任公司 | 2019-02-15 | — | — | CN | disclosed |
| CN-106243514-A | The compositions processed for pattern and method | 罗门哈斯电子材料有限责任公司 | 2016-12-21 | — | — | CN | disclosed |
| CN-106249540-A | Pattern treatment method | 陶氏环球技术有限责任公司 | 2016-12-21 | — | — | CN | disclosed |
| CN-106243513-A | The compositions processed for pattern and method | 陶氏环球技术有限责任公司 | 2016-12-21 | — | — | CN | disclosed |
| CN-106249539-A | Pattern treatment method | 罗门哈斯电子材料有限责任公司 | 2016-12-21 | — | — | CN | disclosed |
| CN-106154748-A | Photoresist finish compositions and the method for processing photo-corrosion-resisting agent composition | 罗门哈斯电子材料有限责任公司 | 2016-11-23 | — | — | CN | disclosed |
| CN-106094431-A | Photo-corrosion-resisting agent composition and method | 罗门哈斯电子材料韩国有限公司 | 2016-11-09 | — | — | CN | disclosed |
| CN-105739237-A | PHOTOLITHOGRAPHIC METHODS | 罗门哈斯电子材料有限责任公司 | 2016-07-06 | — | — | CN | disclosed |
| CN-105573063-A | Pattern formation methods | ROHM & HAAS ELECT MAT | 2016-05-11 | — | — | CN | disclosed |
| CN-105573058-A | Photoresist overcoat compositions | ROHM & HAAS ELECT MAT | 2016-05-11 | — | — | CN | disclosed |
| CN-105388709-A | Multiple-pattern forming methods | ROHM & HAAS ELECT MAT | 2016-03-09 | — | — | CN | disclosed |
| CN-105319844-A | Pattern shrink method | DOW GLOBAL TECHNOLOGIES LLC | 2016-02-10 | — | — | CN | disclosed |