M-Xylene

M-Xylene

SCHEMBL28049985

Cc1cccc(C)c1.O=CNCCO.O=CNCCO

nearest known ligand 0.45

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 2/20 0.44
MAPT P10636 2/20 0.42
KDM4E B2RXH2 2/20 0.42
ALDH1A1 P00352 2/20 0.42
GAA P10253 1/20 0.42
MAPK1 P28482 1/20 0.42
CASP6 P55212 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
CYP1A2 P05177 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
HTT P42858 1/20 0.41
EGFR P00533 1/20 0.40
KMT2A Q03164 1/20 0.40
TP53 P04637 1/20 0.39
ALOX15 P16050 1/20 0.39
FBP1 P09467 5/20 0.39
HDAC8 Q9BY41 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14141435 0.76 TAAR1 (0.52) ALDH1A1KMT2AHDAC8HDAC6
M-Xylene SCHEMBL246698 0.75 ACHE (0.71) ACHEMAPTALDH1A1MAPK1CYP1A2
SCHEMBL197687 0.74
M-Xylene SCHEMBL27997751 0.73 PARP1 (0.47) ACHEMAPTKDM4EALDH1A1GAA
M-Xylene SCHEMBL28292894 0.73 ACHE (0.67) ACHEALDH1A1GAAMAPK1TP53
Water SCHEMBL27829127 0.72
Metacresol SCHEMBL28415102 0.72 ACHE (0.65) ACHEMAPTKDM4EALDH1A1GAA
SCHEMBL3306896 0.72 ADH1B (0.59) ACHEKDM4EALDH1A1MAPK1CYP1A2
M-Xylene SCHEMBL27298104 0.71 ACHE (0.57) ACHEMAPTALDH1A1GAAMAPK1
Benzene SCHEMBL28184017 0.71 ADH1B (0.39) KDM4EALDH1A1L3MBTL1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103339537-B Light-shielding composition, method for producing same, solder resist, and method for forming pattern FUJIFILM CORP. (JP) 2016-02-03 CN disclosed