SCHEMBL2805632

SCHEMBL2805632

O=C(O)C1CCC(C(=O)O)N1

nearest known ligand 0.71

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP2C19 P33261 4/20 0.71
ALOX15 P16050 4/20 0.71
CYP1A2 P05177 4/20 0.71
CYP2D6 P10635 3/20 0.71
LMNA P02545 2/20 0.71
BLM P54132 2/20 0.71
TSHR P16473 2/20 0.71
PMP22 Q01453 2/20 0.71
MEN1 O00255 2/20 0.71
THRB P10828 2/20 0.71
KMT2A Q03164 2/20 0.71
RAB9A P51151 1/20 0.71
SLC1A2 P43004 2/20 0.40
SLC1A3 P43003 1/20 0.40
SLC1A1 P43005 1/20 0.40
GABRP O00591 1/20 0.39
GABRD O14764 1/20 0.39
GABRA1 P14867 1/20 0.39
GABRB1 P18505 1/20 0.39
GABRG2 P18507 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23421119 1.00 CYP2C19 (0.71) CYP2C19ALOX15CYP1A2CYP2D6LMNA
SCHEMBL13973941 1.00 CYP2C19 (0.71) CYP2C19ALOX15CYP1A2CYP2D6LMNA
SCHEMBL16620358 1.00 CYP2C19 (0.71) CYP2C19ALOX15CYP1A2CYP2D6LMNA
SCHEMBL4707192 1.00 CYP2C19 (0.71) CYP2C19ALOX15CYP1A2CYP2D6LMNA
Hydrochloric Acid SCHEMBL25212312 0.97 CYP2C19 (0.67) CYP2C19ALOX15CYP1A2CYP2D6LMNA
SCHEMBL68389 0.88 CYP2D6 (0.63) CYP2C19ALOX15CYP1A2CYP2D6LMNA
SCHEMBL107090 0.88 CYP2D6 (0.63) CYP2C19ALOX15CYP1A2CYP2D6LMNA
SCHEMBL18510082 0.88 CYP2D6 (0.63) CYP2C19ALOX15CYP1A2CYP2D6LMNA
Hydrochloric Acid SCHEMBL3940415 0.85 TSHR (0.60) CYP2C19ALOX15CYP1A2CYP2D6LMNA
Hydrochloric Acid SCHEMBL4707097 0.85 TSHR (0.60) CYP2C19ALOX15CYP1A2CYP2D6LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12098299-B2 Chemical mechanical polishing slurry and use thereof ANJI MICROELECTRONICS (SHANGHAI) CO., LTD. (CN) 2024-09-24 US claimed
CN-118256150-A Chemical mechanical polishing solution 安集微电子科技(上海)股份有限公司 2024-06-28 CN claimed
US-11898063-B2 Chemical-mechanical polishing solution ANJI MICROELECTRONICS (SHANGHAI) CO., LTD. (CN) 2024-02-13 US claimed
CN-111378379-B Chemical mechanical polishing solution and application thereof 安集微电子(上海)有限公司 2022-08-05 CN claimed
CN-111378380-B Chemical mechanical polishing solution and application thereof 安集微电子(上海)有限公司 2022-05-13 CN claimed
US-20220056308-A1 CHEMICAL MECHANICAL POLISHING SLURRY AND USE THEREOF ANJI MICROELECTRONICS (SHANGHAI) CO., LTD (CN) 2022-02-24 US claimed
CN-109971359-B Chemical mechanical polishing solution 安集微电子(上海)有限公司 2021-12-07 CN claimed
CN-108117840-B Silicon nitride chemical mechanical polishing solution 安集微电子科技(上海)股份有限公司 2021-09-21 CN claimed
CN-108117839-B Chemical mechanical polishing solution with high silicon nitride selectivity 安集微电子科技(上海)股份有限公司 2021-09-17 CN claimed
CN-108117838-B Silicon nitride chemical mechanical polishing solution 安集微电子科技(上海)股份有限公司 2021-09-17 CN claimed
CN-111378379-A Chemical mechanical polishing solution and application thereof 安集微电子(上海)有限公司 2020-07-07 CN claimed
CN-109971356-A A kind of chemical mechanical polishing liquid 安集微电子(上海)有限公司 2019-07-05 CN claimed
CN-109971360-A A kind of CMP polishing fluid for silicon nitride and polysilicon 安集微电子(上海)有限公司 2019-07-05 CN claimed
CN-108117838-A A kind of silicon nitride chemical mechanical polishing liquid 安集微电子科技(上海)股份有限公司 2018-06-05 CN claimed
CN-108117839-A A kind of chemical mechanical polishing liquid with high silicon nitride selectivity 安集微电子科技(上海)股份有限公司 2018-06-05 CN claimed
US-8968711-B2 Cosmetic or dermatological composition comprising a polymer bearing junction groups, and cosmetic treatment process L'OREAL (FR) 2015-03-03 US claimed
CN-102548640-B Carbon dioxide absorbing liquid TOSHIBA KK 2015-02-18 CN claimed
US-20100272660-A1 COSMETIC OR PHARMACEUTICAL COMPOSITION COMPRISING A POLYCONDENSATE, THE SAID POLYCONDENSATE AND METHOD OF COSMETIC TREATMENT L'OREAL (FR) 2010-10-28 US claimed
US-20100239509-A1 COSMETIC OR DERMATOLOGICAL COMPOSITION COMPRISING A POLYMER BEARING JUNCTION GROUPS, AND COSMETIC TREATMENT PROCESS L'OREAL (FR) 2010-09-23 US claimed
US-3948933-A CNS DEPRESSANTS, TRANQUILIZERS, ANXIOLYTIC GRUPPO LEPETIT S.P.A. (IT) 1976-04-06 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100239509-A1 COSMETIC OR DERMATOLOGICAL COMPOSITION COMPRISING A POLYMER BEARING JUNCTION GROUPS, AND COSMETIC TREATMENT PROCESS CUTA, SUCLG1, KRT18 CYP2C19 1670/4885ALOX15 914/4885CYP1A2 3261/4885
US-20100272660-A1 COSMETIC OR PHARMACEUTICAL COMPOSITION COMPRISING A POLYCONDENSATE, THE SAID POLYCONDENSATE AND METHOD OF COSMETIC TREATMENT ACMSD, CUTA, PCCA CYP2C19 453/4885ALOX15 383/4885CYP1A2 1104/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.