SCHEMBL28066031

SCHEMBL28066031

CCCc1ccc(Oc2cccc(C=O)c2)cc1

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
▸ RAB9A P51151 2/20 0.54
▸ NPC1 O15118 1/20 0.54
▸ TDP1 Q9NUW8 1/20 0.54
▸ MAOA P21397 7/20 0.51
▸ MAOB P27338 7/20 0.51
▸ FDFT1 P37268 1/20 0.46
▸ SRC P12931 1/20 0.43
▸ THRB P10828 1/20 0.42
▸ ALDH1A1 P00352 2/20 0.42
▸ FFAR1 O14842 2/20 0.41
▸ KDM4E B2RXH2 1/20 0.40
▸ HTT P42858 1/20 0.40
▸ SMN1; SMN2 Q16637 1/20 0.40
▸ FFAR4 Q5NUL3 1/20 0.40
▸ TTR P02766 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7971881 0.90 NPC1 (0.50) RAB9ANPC1TDP1MAOAMAOB
SCHEMBL4942689 0.88 NPC1 (0.56) RAB9ANPC1TDP1MAOAMAOB
SCHEMBL6142777 0.84 ALDH1A1 (0.53) RAB9ATHRBALDH1A1FFAR1KDM4E
SCHEMBL6856729 0.83 SRC (0.56) RAB9ANPC1TDP1MAOAMAOB
SCHEMBL25381878 0.80 FDFT1 (0.57) RAB9ATDP1FDFT1ALDH1A1FFAR1
SCHEMBL31599170 0.80 SRC (0.53) RAB9ANPC1TDP1MAOAMAOB
SCHEMBL6853633 0.80 SRC (0.53) RAB9ANPC1TDP1MAOAMAOB
SCHEMBL11222905 0.80 MAOB (0.59) RAB9ANPC1TDP1MAOAMAOB
SCHEMBL7792570 0.80 NPC1 (0.59) RAB9ANPC1TDP1MAOAMAOB
SCHEMBL6849018 0.80 SRC (0.60) RAB9ANPC1TDP1MAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107429059-A ENERGY-SENSITIVE RESIN COMPOSITION 东京应化工业株式会社 2017-12-01 — — CN disclosed
CN-106575080-A Energy-sensitive resin composition 东京应化工业株式会社 2017-04-19 — — CN disclosed
CN-105579907-A Radiation-sensitive composition and pattern production method TOKYO OHKA KOGYO CO LTD 2016-05-11 — — CN disclosed
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