SCHEMBL28066089

SCHEMBL28066089

O=Cc1ccc(Oc2cc[c]cc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PARP10 Q53GL7 1/20 0.53
PARP3 Q9Y6F1 1/20 0.53
ALDH1A1 P00352 7/20 0.50
KDM4E B2RXH2 4/20 0.50
CYP2A6 P11509 3/20 0.50
LMNA P02545 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
ALDH1A3 P47895 1/20 0.45
STS P08842 1/20 0.44
DRD1 P21728 1/20 0.41
KMT2A Q03164 2/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
HSD17B10 Q99714 1/20 0.39
ALDH5A1 P51649 1/20 0.39
ABAT P80404 1/20 0.39
POLB P06746 1/20 0.39
CASP6 P55212 1/20 0.39
MAPT P10636 2/20 0.38
HPGD P15428 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5050902 0.86 PARP10 (0.65) PARP10PARP3ALDH1A1KDM4ECYP2A6
SCHEMBL1663469 0.86 PARP10 (0.65) PARP10PARP3ALDH1A1KDM4ECYP2A6
Fluoromethane SCHEMBL28219755 0.79 ALDH1A1 (0.62) PARP10PARP3ALDH1A1KDM4ECYP2A6
SCHEMBL28828305 0.79 SRC (0.49) ALDH1A1LMNASMN1; SMN2KMT2AMAPT
SCHEMBL21341 0.78
SCHEMBL609237 0.78 LTA4H (0.44) PARP10ALDH1A1SMN1; SMN2KMT2APOLB
SCHEMBL888020 0.77 ALDH1A1 (0.59) PARP10PARP3ALDH1A1KDM4ECYP2A6
SCHEMBL97639 0.77 ALDH1A1 (0.59) PARP10PARP3ALDH1A1KDM4ECYP2A6
SCHEMBL23975504 0.76 CYP2A6 (0.73) PARP10PARP3ALDH1A1KDM4ECYP2A6
SCHEMBL260405 0.76 CYP2A6 (0.73) PARP10PARP3ALDH1A1KDM4ECYP2A6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107429059-A ENERGY-SENSITIVE RESIN COMPOSITION 东京应化工业株式会社 2017-12-01 CN disclosed
CN-106575080-A Energy-sensitive resin composition 东京应化工业株式会社 2017-04-19 CN disclosed
CN-105579907-A Radiation-sensitive composition and pattern production method TOKYO OHKA KOGYO CO LTD 2016-05-11 CN disclosed