Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9957780 | 0.84 | CTSV (0.36) | — | |
| SCHEMBL1351991 | 0.84 | CTSV (0.36) | — | |
| SCHEMBL685723 | 0.84 | CTSV (0.36) | — | |
| SCHEMBL12847902 | 0.74 | CTSV (0.32) | — | |
| SCHEMBL4689423 | 0.73 | OPRK1 (0.41) | OPRK1 | |
| SCHEMBL4692339 | 0.72 | OPRK1 (0.34) | OPRK1 | |
| SCHEMBL3802243 | 0.72 | ALDH1A1 (0.36) | — | |
| SCHEMBL685114 | 0.71 | CTSV (0.34) | — | |
| SCHEMBL3305757 | 0.70 | — | — | |
| SCHEMBL526020 | 0.69 | POLB (0.46) | CYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107735728-A | Photosensitive composite, colored filter photosensitive composite and colored filter | 东洋油墨SC控股株式会社 | 2018-02-23 | — | — | CN | disclosed |
| CN-104341551-B | The manufacture method of the manufacture method of lithographic printing polymer, the manufacture method of anti-corrosion agent composition and the figuratum substrate of formation | 三菱丽阳株式会社 | 2017-06-09 | — | — | CN | disclosed |
| CN-104159937-B | The manufacture method of copolymer and manufacture method, anti-corrosion agent composition and substrate for photoetching | MITSUBISHI RAYON CO.,LTD. (JP) | 2016-05-18 | — | — | CN | disclosed |
| CN-105518041-A | Copolymer for semiconductor lithography, resist composition, and method for producing substrate | MITSUBISHI RAYON CO | 2016-04-20 | — | — | CN | disclosed |
| CN-103154042-B | Photoetching technique multipolymer and manufacture method thereof, anti-corrosion agent composition, forms the manufacture method of the substrate of pattern, the evaluation method of multipolymer, multipolymer composition analytic method | MITSUBISHI RAYON CO.,LTD. (JP) | 2015-12-16 | — | — | CN | disclosed |
| CN-103619889-B | Polymkeric substance and manufacture method thereof | MITSUBISHI RAYON CO.,LTD. (JP) | 2015-10-07 | — | — | CN | disclosed |
| CN-104341551-A | METHOD OF MANUFACTURING POLYMER FOR LITHOGRAPHY, METHOD OF MANUFACTURING RESIST COMPOSITION, AND METHOD OF MANUFACTURING SUBSTRATE HAVING PATTERN | MITSUBISHI RAYON CO | 2015-02-11 | — | — | CN | disclosed |
| CN-104159937-A | Copolymer for lithography and method for manufacturing same, resist composition, and method for manufacturing substrate | MITSUBISHI RAYON CO | 2014-11-19 | — | — | CN | disclosed |
| CN-102472982-B | Copolymer for lithography and method for evaluating the same | MITSUBISHI RAYON CO | 2014-07-02 | — | — | CN | disclosed |
| CN-103619889-A | Polymer and method for producing same | MITSUBISHI RAYON CO | 2014-03-05 | — | — | CN | disclosed |
| CN-103154042-A | Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions | MITSUBISHI RAYON CO | 2013-06-12 | — | — | CN | disclosed |