1,2-Diethoxybenzene

1,2-Diethoxybenzene

SCHEMBL28074335

CCC(=O)CC.CCOc1ccccc1OCC

nearest known ligand 0.66

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 5/20 0.66
GLA P06280 1/20 0.66
MAPT P10636 3/20 0.55
NPSR1 Q6W5P4 1/20 0.55
HCRTR1 O43613 2/20 0.53
GAA P10253 2/20 0.53
ALDH1A1 P00352 3/20 0.52
MRGPRX4 Q96LA9 1/20 0.50
CYP2C19 P33261 2/20 0.47
KDM4E B2RXH2 1/20 0.47
KMT2A Q03164 1/20 0.47
ALOX15 P16050 1/20 0.47
TDP1 Q9NUW8 2/20 0.47
CYP1A2 P05177 1/20 0.47
CYP2D6 P10635 1/20 0.47
HPGD P15428 2/20 0.46
LMNA P02545 1/20 0.46
MAPK1 P28482 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
1,2-Diethoxybenzene SCHEMBL28398613 0.84 L3MBTL1 (0.74) L3MBTL1GLAMAPTNPSR1HCRTR1
1,2-Diethoxybenzene SCHEMBL578986 0.83 ALDH1A1 (0.68) L3MBTL1GLAMAPTNPSR1HCRTR1
1,2-Diethoxybenzene SCHEMBL29428929 0.83 ALDH1A1 (0.68) L3MBTL1GLAMAPTNPSR1HCRTR1
SCHEMBL14765242 0.83 L3MBTL1 (0.56) L3MBTL1GLAMAPTNPSR1HCRTR1
1,2-Diethoxybenzene SCHEMBL28400278 0.83 L3MBTL1 (0.66) L3MBTL1GLAMAPTNPSR1HCRTR1
SCHEMBL6249085 0.82 L3MBTL1 (0.59) L3MBTL1GLAMAPTNPSR1HCRTR1
Phenetole SCHEMBL27329112 0.81 LTA4H (0.61) L3MBTL1GLAMAPTKMT2AALOX15
SCHEMBL2380676 0.81 L3MBTL1 (0.63) L3MBTL1GLAMAPTNPSR1HCRTR1
1,2-Dimethoxybenzene SCHEMBL27275892 0.80 CA1 (0.59) L3MBTL1ALDH1A1KMT2ALMNAMAPK1
1,2-Diethoxybenzene SCHEMBL28608089 0.79 L3MBTL1 (0.61) L3MBTL1GLAMAPTNPSR1HCRTR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110402275-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern in display substrate using the same, and bezel pattern manufactured thereby LG CHEMICAL LTD 2019-11-01 CN disclosed
CN-110291121-A Gap filler, the tool for processing gap filler and external member and illuminating device KDS控股有限公司 2019-09-27 CN disclosed
CN-107004384-B Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2019-09-06 CN disclosed
CN-106488959-B Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same, and frame pattern manufactured by using same 株式会社LG化学 2019-08-23 CN disclosed
CN-106164132-B polyimide composition 富士胶片电子材料美国有限公司 2019-08-23 CN disclosed
CN-110088163-A Curable resin composition, and film, molded article, prepreg, and fiber-reinforced plastic using same 三菱化学株式会社 2019-08-02 CN disclosed
CN-105849862-B Resin combination, dry-etching photoresistive mask and pattern forming method DIC株式会社 2019-07-05 CN disclosed
CN-109750523-A Synthetic leather and its manufacturing method DIC株式会社 2019-05-14 CN disclosed
CN-109656099-A The preparation method of anti-reflection array substrate and its anti-reflection array substrate of preparation 深圳市华星光电半导体显示技术有限公司 2019-04-19 CN disclosed
CN-109071785-A Modified rosin resin and its manufacturing method, curable with actinic energy ray planographic ink varnish, curable with actinic energy ray planographic ink and printed article 东洋油墨SC控股株式会社 2018-12-21 CN disclosed
CN-107004384-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001825-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001826-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern of display substrate using the same, and bezel pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-107001824-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate using same, and frame pattern manufactured thereby 株式会社LG化学 2017-08-01 CN disclosed
CN-105658699-B Fluorine-containing compound, composition for forming hard coat layer, and article having hard coat layer 旭硝子株式会社 2017-06-23 CN disclosed
CN-106536644-A Ultraviolet-curable ink composition, method of manufacturing bezel pattern of display substrate using the same, and bezel pattern manufactured thereby 株式会社LG化学 2017-03-22 CN disclosed
CN-106488959-A Ultraviolet-curable ink composition, method for manufacturing frame pattern of display substrate by using same, and frame pattern manufactured by using same 株式会社LG化学 2017-03-08 CN disclosed
CN-106164132-A Novel polyimide compositions 富士胶片电子材料美国有限公司 2016-11-23 CN disclosed
CN-106032444-A Anti-reflection glue film and manufacturing method thereof 逢甲大学 2016-10-19 CN disclosed
CN-104080877-B Anti-fingerprint adhesive agent and manufacture method, hard coat compositions, the base material with hard coat and touch screen 旭硝子株式会社 2016-08-17 CN disclosed