SCHEMBL28075742

SCHEMBL28075742

CCCCOc1c2ccccc2c(OCCCC)c2ccccc12.CCOc1c2ccccc2c(OCC)c2ccccc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 3/20 0.47
TP53 P04637 1/20 0.46
MAPT P10636 1/20 0.46
CYP1A2 P05177 1/20 0.46
CYP2C9 P11712 1/20 0.46
CYP2C19 P33261 1/20 0.46
MPO P05164 1/20 0.44
TDP1 Q9NUW8 2/20 0.42
L3MBTL1 Q9Y468 2/20 0.42
GAA P10253 1/20 0.42
KCNH2 Q12809 1/20 0.41
NQO1 P15559 1/20 0.41
GABRP O00591 1/20 0.41
GABRD O14764 1/20 0.41
GABRA1 P14867 1/20 0.41
GABRB1 P18505 1/20 0.41
GABRG2 P18507 1/20 0.41
GABRB3 P28472 1/20 0.41
GABRA5 P31644 1/20 0.41
GABRA3 P34903 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL442080 0.94 LTA4H (0.52) LTA4HTP53MAPTCYP1A2CYP2C9
SCHEMBL29363526 0.94 LTA4H (0.52) LTA4HTP53MAPTCYP1A2CYP2C9
SCHEMBL27262240 0.89 LTA4H (0.48) LTA4HTP53MAPTCYP1A2CYP2C9
SCHEMBL600606 0.87 LTA4H (0.52) LTA4HTP53MAPTCYP1A2CYP2C9
SCHEMBL347692 0.87 LTA4H (0.50) LTA4HTP53MAPTCYP1A2CYP2C9
SCHEMBL29366895 0.87 ALDH1A1 (0.50) LTA4HMAPTCYP1A2MPOL3MBTL1
SCHEMBL51657 0.87 ALDH1A1 (0.50) LTA4HMAPTCYP1A2MPOL3MBTL1
SCHEMBL23271691 0.86 SMN1; SMN2 (0.60) LTA4HTP53MAPTCYP1A2CYP2C9
SCHEMBL29502705 0.86 LTA4H (0.46) LTA4HMAPTCYP1A2CYP2C9CYP2C19
SCHEMBL4110312 0.86 LTA4H (0.46) LTA4HTP53MAPTCYP1A2CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104541202-B Resin combination, cured film, object and its preparation method and display device with pattern 富士胶片株式会社 2019-03-01 CN disclosed
CN-102540726-B Positive-type photosensitive resin composition, cured film and forming method thereof, interlayer dielectric and display device 富士胶片株式会社 2016-07-06 CN disclosed