Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL51195 | 0.82 | — | — | |
| SCHEMBL14218504 | 0.76 | — | — | |
| SCHEMBL19253869 | 0.74 | SMN1; SMN2 (0.33) | ALDH1A1TDP1SMN1; SMN2 | |
| SCHEMBL7861482 | 0.74 | ALDH1A1 (0.47) | ALDH1A1THRBSMN1; SMN2 | |
| SCHEMBL28797996 | 0.73 | — | — | |
| SCHEMBL27631233 | 0.73 | — | — | |
| SCHEMBL51996 | 0.73 | — | — | |
| SCHEMBL18418958 | 0.73 | THRB (0.37) | ALDH1A1THRB | |
| SCHEMBL51214 | 0.72 | — | — | |
| SCHEMBL4450203 | 0.71 | ALDH1A1 (0.30) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110537146-A | Photosensitive resin composition | NISSAN CHEMICAL CORP | 2019-12-03 | — | — | CN | disclosed |
| CN-105283806-B | Colored photosensitive resin composition, cured film, color filter and method for producing same, solid-state imaging element, and image display device | 富士胶片株式会社 | 2019-11-12 | — | — | CN | disclosed |
| CN-110366768-A | The composition for forming coating removed for foreign matter | 日产化学株式会社 | 2019-10-22 | — | — | CN | disclosed |
| CN-106715532-B | Triazine ring-containing polymer and composition comprising same | 日产化学工业株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-110007557-A | Solidification compound, film, optical film, illuminated display element panel and luminous display unit | 东京应化工业株式会社 | 2019-07-12 | — | — | CN | disclosed |
| CN-109976090-A | Thermosetting composition, cured film and display device | 日铁化学材料株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-105143979-B | Composition is used in the formation of resist lower membrane | 日产化学工业株式会社 | 2019-07-05 | — | — | CN | disclosed |
| CN-109962089-A | The manufacturing method of wavelength convert substrate | 东京应化工业株式会社 | 2019-07-02 | — | — | CN | disclosed |
| CN-109952631-A | Composition is used in protective film formation | 日产化学株式会社 | 2019-06-28 | — | — | CN | disclosed |
| CN-105492973-B | Method for forming pattern using resist underlayer film | 日产化学工业株式会社 | 2019-06-11 | — | — | CN | disclosed |
| CN-109557765-A | Photosensitive polymer combination, cured film, display device and pattern forming method | 东京应化工业株式会社 | 2019-04-02 | — | — | CN | disclosed |
| CN-109416512-A | Resist lower membrane formation composition comprising the compound with hydantoins ring | 日产化学株式会社 | 2019-03-01 | — | — | CN | disclosed |
| CN-109071807-A | Polymer containing triazine ring and the composition comprising the polymer | 日产化学株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-104272145-B | Film formation composition | 日产化学工业株式会社 | 2018-01-23 | — | — | CN | disclosed |
| CN-105377997-B | Method for producing dye multimer, and method for producing coloring composition | 富士胶片株式会社 | 2017-04-12 | — | — | CN | disclosed |
| CN-104024331-B | Amine/the epoxy resin cure of benzimidazole dihydrochloride | 3M创新有限公司 | 2016-10-19 | — | — | CN | disclosed |
| CN-105980496-A | Film-forming composition | 日产化学工业株式会社 | 2016-09-28 | — | — | CN | disclosed |
| CN-105980497-A | Protective film forming composition for transparent conductive film | 日产化学工业株式会社 | 2016-09-28 | — | — | CN | disclosed |
| CN-103443708-B | Negative photosensitive resin composition | 日产化学工业株式会社 | 2016-08-24 | — | — | CN | disclosed |
| CN-105849642-A | Resist underlayer film forming composition containing copolymer having triazine ring and sulfur atom in main chain | 日产化学工业株式会社 | 2016-08-10 | — | — | CN | disclosed |