Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.56 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.56 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.39 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.39 |
| ▸ | EGFR | P00533 | 1/20 | 0.38 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | HPGD | P15428 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzaldehyde SCHEMBL28218440 | 0.90 | ALDH1A1 (0.64) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL28129001 | 0.87 | ALDH1A1 (0.67) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL27939687 | 0.86 | ALDH1A1 (0.58) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL28089327 | 0.85 | ALDH1A1 (0.70) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Pentadecane SCHEMBL27722034 | 0.83 | ALDH1A1 (0.61) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL27780817 | 0.83 | ALDH1A1 (0.74) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL3088932 | 0.83 | ALDH1A1 (0.74) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL28288211 | 0.82 | ALDH1A1 (0.54) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL27759517 | 0.82 | ALDH1A1 (0.54) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 | |
| Benzaldehyde SCHEMBL27281339 | 0.82 | ALDH1A1 (0.54) | ALDH1A1CYP2A6LMNATDP1ALDH3A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108137478-A | Compound, resin, resist composition or radiation-sensitive composition, method for forming resist pattern, method for producing amorphous film, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for forming circuit pattern, and purification method | 三菱瓦斯化学株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-107533290-A | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | 三菱瓦斯化学株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-107430337-A | RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN FORMATION METHOD | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107428646-A | Compound, resin and their purification process, lower floor's film formation material of photoetching, lower membrane formation with composition and lower membrane and, corrosion-resisting pattern forming method and circuit pattern forming method | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107428717-A | Resist composition, resist pattern forming method, and polyphenol compound used for same | 三菱瓦斯化学株式会社 | 2017-12-01 | — | — | CN | disclosed |
| CN-107407874-A | Radiation-sensitive composition, amorphous film and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-103717562-B | Cyclic compound, its manufacture method, compositions and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2016-08-24 | — | — | CN | disclosed |