Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 6/20 | 0.64 |
| ▸ | CES2 | O00748 | 2/20 | 0.64 |
| ▸ | CES1 | P23141 | 2/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.51 |
| ▸ | TTR | P02766 | 3/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.43 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | ELANE | P08246 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | PTPRC | P08575 | 1/20 | 0.41 |
| ▸ | MCL1 | Q07820 | 2/20 | 0.41 |
| ▸ | BCL2 | P10415 | 1/20 | 0.41 |
| ▸ | APAF1 | O14727 | 2/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.40 |
| ▸ | MITF | O75030 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoin SCHEMBL28866446 | 1.00 | LMNA (0.64) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28073150 | 0.96 | LMNA (0.58) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28149714 | 0.93 | LMNA (0.55) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28848611 | 0.90 | LMNA (0.55) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28166292 | 0.89 | LMNA (0.81) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28100747 | 0.89 | LMNA (0.81) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL1471128 | 0.86 | LMNA (0.70) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL28294575 | 0.84 | LMNA (0.78) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL9490022 | 0.80 | LMNA (0.84) | LMNACES2CES1ALDH1A1KDM4E | |
| Benzoin SCHEMBL8974816 | 0.80 | CES2 (0.91) | LMNACES2CES1ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110429090-A | Photoelectric conversion device and equipment | CANON KK | 2019-11-08 | — | — | CN | disclosed |
| CN-110392919-A | Pattern forming method and processing substrate, optical component and quartz molds duplicate manufacturing method and for imprint pretreated coating material and its with the combination of imprint Resist | 佳能株式会社 | 2019-10-29 | — | — | CN | disclosed |
| CN-110366703-A | Substrate pretreatment compositions for nano-imprint lithography | 佳能株式会社 | 2019-10-22 | — | — | CN | disclosed |
| CN-106537557-B | Adhesion layer composition passes through the method that nano impression forms film, the manufacturing method of optical module, circuit board and electronic equipment | 佳能株式会社 | 2019-06-18 | — | — | CN | disclosed |
| CN-109075033-A | Pattern forming method, method for manufacturing processed substrate, method for manufacturing optical module, method for manufacturing circuit substrate, method for manufacturing electronic module, and method for manufacturing imprint mold | 佳能株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-108885976-A | Pattern forming method, production method, the production method of optical component, the production method of circuit board, the production method of the production method of electronic component and imprint mold for processing substrate | 佳能株式会社 | 2018-11-23 | — | — | CN | disclosed |
| CN-104737271-B | The manufacture method of Photocurable composition and film | 佳能株式会社 | 2018-04-10 | — | — | CN | disclosed |
| CN-105493236-B | Curable composition for photoimprint and method for producing film, optical component, circuit board or electronic component using the same | 佳能株式会社 | 2018-01-19 | — | — | CN | disclosed |
| CN-105340061-B | Photocurable composition and method for manufacturing optical module using same | 佳能株式会社 | 2017-12-22 | — | — | CN | disclosed |
| CN-105340062-B | Photocurable composition and method for manufacturing optical module using same | 佳能株式会社 | 2017-11-21 | — | — | CN | disclosed |
| CN-107251193-A | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2017-10-13 | — | — | CN | disclosed |
| CN-107078025-A | Photocurable composition, and the method for forming cured-product patterns and manufacture optical component, circuit board and imprint mold using it | 佳能株式会社 | 2017-08-18 | — | — | CN | disclosed |
| CN-104115256-B | Photocured product and its manufacture method | 佳能株式会社 | 2017-08-08 | — | — | CN | disclosed |
| CN-106842835-A | Substrate pretreatment to reduce fill time in nanoimprint lithography | 佳能株式会社 | 2017-06-13 | — | — | CN | disclosed |
| CN-106574007-A | Photocurable composition, method for producing cured product pattern using same, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2017-04-19 | — | — | CN | disclosed |
| CN-106537557-A | Adhesion layer composition, method for forming film by nanoimprinting, and methods for manufacturing optical component, circuit board and electronic apparatus | 佳能株式会社 | 2017-03-22 | — | — | CN | disclosed |
| CN-104640884-B | The manufacture method of the film of Photocurable composition and the described compositions of use | 佳能株式会社 | 2016-10-12 | — | — | CN | disclosed |
| CN-104487229-B | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | 佳能株式会社 | 2016-10-05 | — | — | CN | disclosed |