Benzoin

Benzoin

SCHEMBL28294575

O=C(c1ccccc1)C(O)c1ccccc1.O=C1C(=O)c2ccccc2-c2ccccc21

nearest known ligand 0.78

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 6/20 0.78
CES2 O00748 4/20 0.78
CES1 P23141 4/20 0.78
ALDH1A1 P00352 3/20 0.56
KDM4E B2RXH2 2/20 0.56
TDP1 Q9NUW8 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
MAPK1 P28482 2/20 0.50
PTPRC P08575 3/20 0.49
MAPT P10636 2/20 0.48
HTT P42858 2/20 0.48
S100A4 P26447 2/20 0.48
MEN1 O00255 1/20 0.48
APAF1 O14727 1/20 0.48
TERT O14746 1/20 0.48
NPC1 O15118 1/20 0.48
PLIN1 O60240 1/20 0.48
TDP2 O95551 1/20 0.48
S1PR4 O95977 1/20 0.48
PLA2G1B P04054 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzoin SCHEMBL28166292 0.94 LMNA (0.81) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL28100747 0.94 LMNA (0.81) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL27696284 0.88 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL28120851 0.88 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL5833429 0.88 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL145 0.88 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL10665271 0.88 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL901258 0.88 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL2025536 0.88 CES2 (1.00) LMNACES2CES1ALDH1A1KDM4E
Benzoin SCHEMBL1471128 0.88 LMNA (0.70) LMNACES2CES1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109782553-A Photoresist developer 台湾积体电路制造股份有限公司 2019-05-21 CN disclosed
CN-109782540-A The forming method of photoetching agent pattern 台湾积体电路制造股份有限公司 2019-05-21 CN disclosed