Toluene

Toluene

SCHEMBL28106985

Cc1ccccc1.O=S(O)c1ccccc1

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.52
TSHR P16473 1/20 0.52
ALOX12 P18054 1/20 0.52
ACHE P22303 1/20 0.52
CES2 O00748 1/20 0.41
CES1 P23141 1/20 0.41
HPGD P15428 2/20 0.41
KMT2A Q03164 3/20 0.39
MEN1 O00255 2/20 0.39
NPC1 O15118 2/20 0.38
RAB9A P51151 2/20 0.38
ALDH1A1 P00352 3/20 0.36
MAPT P10636 2/20 0.36
KDM4E B2RXH2 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
SMN1; SMN2 Q16637 4/20 0.36
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
AKR1C3 P42330 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Toluene SCHEMBL14855911 0.88 LMNA (0.41) LMNATSHRALOX12ACHECES2
SCHEMBL9175 0.87
SCHEMBL10663817 0.87 HPGD (0.43) TSHRCES2CES1HPGDALDH1A1
SCHEMBL49328 0.87
SCHEMBL16674608 0.87
SCHEMBL3157755 0.86 ACHE (0.50) LMNATSHRALOX12ACHECES2
SCHEMBL11298939 0.85 HPGD (0.41) TSHRCES2CES1HPGDALDH1A1
SCHEMBL7969703 0.85 HPGD (0.41) TSHRCES2CES1HPGDALDH1A1
SCHEMBL64469 0.85 HPGD (0.41) TSHRCES2CES1HPGDALDH1A1
SCHEMBL1023085 0.85 HPGD (0.41) TSHRCES2CES1HPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106164772-B The production method of photosensitive polymer combination, original edition of lithographic printing plate and lithographic printing plate 富士胶片株式会社 2019-09-03 CN disclosed
CN-106133605-B Photosensitive resin composition, lithographic printing plate precursor, and method for producing lithographic printing plate 富士胶片株式会社 2019-07-12 CN disclosed
CN-108700813-A Positive photosensitive resin composition, positive lithographic printing plate precursor, and method for producing lithographic printing plate 富士胶片株式会社 2018-10-23 CN disclosed
CN-107835960-A Photosensitive resin composition, lithographic printing plate precursor, and method for making lithographic printing plate 富士胶片株式会社 2018-03-23 CN disclosed
CN-107209459-A Photosensitive resin composition, lithographic printing plate precursor, method for producing lithographic printing plate, and polymer compound 富士胶片株式会社 2017-09-26 CN disclosed
CN-107077069-A Photosensitive resin composition, lithographic printing plate precursor, method for producing lithographic printing plate, and polymer compound 富士胶片株式会社 2017-08-18 CN disclosed
CN-106164772-A The manufacture method of photosensitive polymer combination, original edition of lithographic printing plate and lithographic plate 富士胶片株式会社 2016-11-23 CN disclosed
CN-106133605-A Photosensitive resin composition, lithographic printing plate precursor, and method for producing lithographic printing plate 富士胶片株式会社 2016-11-16 CN disclosed