SCHEMBL28108398

SCHEMBL28108398

C=C(C)C(=O)NCOCC(C)C.C=CC(=O)NOC

nearest known ligand 0.35

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.35
ALDH1A1 P00352 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL134916 0.84 TSHR (0.47) TSHRALDH1A1
SCHEMBL7601590 0.82 TSHR (0.36) TSHRALDH1A1
SCHEMBL7773164 0.80 TSHR (0.41) TSHRALDH1A1
SCHEMBL167298 0.77 TSHR (0.47) TSHRALDH1A1
SCHEMBL28479817 0.76 TSHR (0.43) TSHRALDH1A1
SCHEMBL27547001 0.75 PAOX (0.37) TSHRALDH1A1
Ethylene Glycol SCHEMBL8572356 0.73 TSHR (0.43) TSHRALDH1A1
SCHEMBL28108400 0.73 TSHR (0.35) TSHR
SCHEMBL28108433 0.73 ALDH1A1 (0.35) TSHRALDH1A1
SCHEMBL28040223 0.72 TSHR (0.43) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104995277-B Composition for polishing, composition for polishing manufacture method and abrasive material manufacture method 福吉米株式会社 2018-05-08 CN disclosed
CN-105073941-B Composition for polishing and abrasive material manufacture method 福吉米株式会社 2018-01-30 CN disclosed
CN-106233423-A composition for polishing silicon wafer 福吉米株式会社 2016-12-14 CN disclosed