SCHEMBL28109033

SCHEMBL28109033

Oc1ccc(C[Au])cc1.c1cc2cc-2c1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 6/20 0.60
▸ MEN1 O00255 1/20 0.60
▸ KMT2A Q03164 1/20 0.60
▸ ABL1 P00519 2/20 0.52
▸ ABCB1 P08183 2/20 0.52
▸ BCR P11274 2/20 0.52
▸ HSD17B1 P14061 4/20 0.50
▸ HSD17B2 P37059 4/20 0.50
▸ MMP3 P08254 2/20 0.46
▸ ESR2 Q92731 5/20 0.45
▸ ABAT P80404 1/20 0.44
▸ CYP3A4 P08684 4/20 0.43
▸ CYP2C9 P11712 3/20 0.43
▸ APP P05067 1/20 0.41
▸ BCL2L1 Q07817 1/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP2D6 P10635 1/20 0.41
▸ CYP2B6 P20813 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ KEAP1 Q14145 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28108647 0.83 — —
SCHEMBL28199055 0.82 ESR1 (0.67) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL13074463 0.78 ESR1 (0.74) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL27704396 0.78 ESR1 (0.60) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL27927635 0.77 ESR1 (0.58) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL699012 0.76 ESR1 (1.00) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL27269728 0.75 ESR1 (0.56) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL28581912 0.74 MMP3 (0.74) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL19730255 0.74 ESR1 (0.65) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL27704402 0.74 ESR1 (0.54) ESR1MEN1KMT2AABL1ABCB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104755422-B Method for producing cyanogen halide, cyanate ester compound and method for producing same, and resin composition 三菱瓦斯化学株式会社 2016-11-09 — — CN disclosed
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