SCHEMBL699012

SCHEMBL699012

Oc1ccc(-c2cccc(-c3ccc(O)cc3)c2)cc1

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 8/20 1.00
▸ MEN1 O00255 1/20 1.00
▸ KMT2A Q03164 1/20 1.00
▸ ABL1 P00519 3/20 0.81
▸ ABCB1 P08183 3/20 0.81
▸ BCR P11274 3/20 0.81
▸ HSD17B1 P14061 4/20 0.80
▸ HSD17B2 P37059 4/20 0.80
▸ CYP3A4 P08684 2/20 0.70
▸ CYP2C9 P11712 2/20 0.70
▸ ESR2 Q92731 7/20 0.70
▸ MMP3 P08254 2/20 0.68
▸ BCL2L1 Q07817 1/20 0.68
▸ APP P05067 1/20 0.59
▸ ALOX5 P09917 1/20 0.59
▸ CYP1A2 P05177 1/20 0.56
▸ CYP2D6 P10635 1/20 0.56
▸ CYP2B6 P20813 1/20 0.56
▸ CYP2C19 P33261 1/20 0.56

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19845794 0.95 ESR1 (0.90) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL30864393 0.95 ESR1 (0.90) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL27738902 0.95 ESR1 (0.90) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL1179866 0.92 HSD17B1 (0.95) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL19139538 0.92 ESR1 (0.84) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL10338169 0.91 ESR1 (0.82) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL29404406 0.89 HSD17B1 (1.00) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL7129229 0.89 HSD17B1 (1.00) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL1180998 0.89 HSD17B1 (1.00) ESR1MEN1KMT2AABL1ABCB1
SCHEMBL70625 0.89 HSD17B1 (1.00) ESR1MEN1KMT2AABL1ABCB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 153 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120048294-A Photopolymer holographic recording medium, preparation method and application thereof 珠海莫界科技有限公司 2025-05-27 — — CN claimed
EP-2851359-B1 METHOD FOR PRODUCING 4,4''-DIHYDROXY-M-TERPHENYLS HONSHU CHEMICAL IND (JP) 2017-03-29 — — EP claimed
US-20170073287-A1 PROCESS FOR THE MANUFACTURE OF TERPHENYL COMPOUNDS SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2017-03-16 — — US claimed
US-20170036978-A1 PROCESS FOR THE MANUFACTURE OF TERPHENYL COMPOUNDS SOLVAY SPECIALTY POLYMERS USA, LLC (US) 2017-02-09 — — US claimed
US-9102596-B2 Method of manufacturing 4,4″-dihydroxy-m-terphenyl HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2015-08-11 — — US claimed
US-20150158800-A1 METHOD OF MANUFACTURING 4,4\"-DIHYDROXY-M-TERPHENYL HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2015-06-11 — — US claimed
EP-2851359-A1 METHOD FOR PRODUCING 4,4''-DIHYDROXY-M-TERPHENYLS Honshu Chemical Industry Co., Ltd. (JP) 2015-03-25 — — EP claimed
US-7393914-B2 Polyethersulfone compositions GENERAL ELECTRIC COMPANY (US) 2008-07-01 — — US claimed
US-20060030683-A1 Polyethersulfone compositions GENERAL ELECTRIC COMPANY 2006-02-09 — — US claimed
US-20260055236-A1 POLYETHER NITRILE WITH IMPROVED CRYSTALLIZATION SPEED AND METHOD FOR PRODUCING THE SAME, AND POLYETHER NITRILE RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME HONSHU CHEMICAL IND (JP) 2026-02-26 — — US disclosed
EP-4585635-A1 POLYETHER NITRILE WITH IMPROVED CRYSTALLIZATION SPEED, METHOD FOR PRODUCING SAME, POLYETHER NITRILE RESIN COMPOSITION, AND METHOD FOR PRODUCING SAME Honshu Chemical Industry Co., Ltd. (JP) 2025-07-16 — — EP disclosed
CN-120048294-A Photopolymer holographic recording medium, preparation method and application thereof 珠海莫界科技有限公司 2025-05-27 — — CN disclosed
CN-119731238-A Polyether nitrile having improved crystallization rate and method for producing same, polyether nitrile resin composition and method for producing same 本州化学工业株式会社 2025-03-28 — — CN disclosed
US-20250026886-A1 METHOD FOR PRODUCING POLYETHER NITRILE HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2025-01-23 — — US disclosed
US-5204442-A Polyether polymers derived from 4,4\"-dihydroxy-m-terphenyls GENERAL ELECTRIC COMPANY (US) 1993-04-20 — — US disclosed
US-5204442-A Polyether polymers derived from 4,4\"-dihydroxy-m-terphenyls GENERAL ELECTRIC COMPANY (US) 1993-04-20 — — US disclosed
US-5204442-A Polyether polymers derived from 4,4\"-dihydroxy-m-terphenyls GENERAL ELECTRIC COMPANY (US) 1993-04-20 — — US disclosed
US-5153300-A Aromatic polyesters with high glass transition temperature, improved solvent resistance GENERAL ELECTRIC COMPANY (US) 1992-10-06 — — US disclosed
US-4956440-A Arylamine containing polyhydroxyether resins XEROX CORPORATION (US) 1990-09-11 — — US disclosed
US-4818650-A Arylamine containing polyhydroxy ether resins and system utilizing arylamine containing polyhydroxyl ether resins XEROX CORPORATION (US) 1989-04-04 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260055236-A1 POLYETHER NITRILE WITH IMPROVED CRYSTALLIZATION SPEED AND METHOD FOR PRODUCING THE SAME, AND POLYETHER NITRILE RESIN COMPOSITION AND METHOD FOR PRODUCING THE SAME MNS1, RPL7, NOM1 ESR1 3958/4885MEN1 1021/4885KMT2A 3838/4885
US-20170036978-A1 PROCESS FOR THE MANUFACTURE OF TERPHENYL COMPOUNDS ALK, PIK3C3, ITK ESR1 2753/4885MEN1 2222/4885KMT2A 1124/4885
US-20150158800-A1 METHOD OF MANUFACTURING 4,4\"-DIHYDROXY-M-TERPHENYL CYP1A1, CYP4B1, CYP1B1 ESR1 731/4885MEN1 3146/4885KMT2A 1022/4885
US-20170073287-A1 PROCESS FOR THE MANUFACTURE OF TERPHENYL COMPOUNDS C9, C5, TECR ESR1 3128/4885MEN1 765/4885KMT2A 2340/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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