SCHEMBL28109999

SCHEMBL28109999

CC=C(C(=O)OC)C(C)(C)C

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.36
TET2 Q6N021 1/20 0.34
KEAP1 Q14145 1/20 0.33
NFE2L2 Q16236 1/20 0.33
HCAR2 Q8TDS4 1/20 0.33
DGAT1 O75907 1/20 0.31
EGLN1 Q9GZT9 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3142946 0.79
SCHEMBL8087734 0.79
SCHEMBL27320729 0.77
SCHEMBL3175570 0.77
SCHEMBL18655700 0.77 ALDH1A1 (0.37) ALDH1A1TET2KEAP1NFE2L2HCAR2
SCHEMBL11167344 0.75
SCHEMBL11128170 0.73 KEAP1 (0.31) KEAP1NFE2L2HCAR2
SCHEMBL28206965 0.72 ALDH1A1 (0.32) ALDH1A1TET2
SCHEMBL15804065 0.70 ALDH1A1 (0.33) ALDH1A1TET2KEAP1NFE2L2HCAR2
SCHEMBL5696045 0.69 EPHX1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106556972-A For the overcoat composition and method of photoetching 罗门哈斯电子材料韩国有限公司 2017-04-05 CN disclosed
CN-106556971-A Photo-corrosion-resisting agent composition and method 罗门哈斯电子材料韩国有限公司 2017-04-05 CN disclosed
CN-106094439-A Overcoat composition and method for photoetching 罗门哈斯电子材料韩国有限公司 2016-11-09 CN disclosed