SCHEMBL28111215

SCHEMBL28111215

NCc1[c]cccc1.[c]1ccccc1

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 2/20 0.37
TAAR1 Q96RJ0 3/20 0.32
DPP4 P27487 1/20 0.30
HTR2A P28223 2/20 0.30
CYP2A6 P11509 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL65919 0.91
SCHEMBL27653179 0.89
SCHEMBL27842976 0.89
SCHEMBL27647038 0.89
SCHEMBL27460429 0.89
SCHEMBL27871051 0.84 LOXL2 (0.33) LOXL2
Zinc Chloride SCHEMBL27784693 0.83 PNMT (0.32) LOXL2
SCHEMBL27699116 0.83 LOXL2 (0.32) LOXL2
SCHEMBL27375509 0.83 LOXL2 (0.32) LOXL2
Magnesium Chloride Anhydrous SCHEMBL27768358 0.83 PNMT (0.32) LOXL2TAAR1HTR2ACYP2A6SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104969127-B Compound, lower layer film for lithography forming material, lower layer film for lithography and pattern forming method 三菱瓦斯化学株式会社 2019-11-26 CN disclosed
CN-106249547-A Photocurable resin composition and use the photo-curable dry film of described compositions 信越化学工业株式会社 2016-12-21 CN disclosed