Dinitrophenylene

Dinitrophenylene

SCHEMBL28111313

COS(=O)(=O)c1ccc(C)cc1.O=[N+]([O-])c1cccc([N+](=O)[O-])c1.SS

nearest known ligand 0.54

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.54
CYP3A4 P08684 2/20 0.54
CYP2C19 P33261 2/20 0.54
TSHR P16473 2/20 0.51
ACHE P22303 2/20 0.51
LMNA P02545 2/20 0.50
GPR17 Q13304 1/20 0.50
NFE2L2 Q16236 1/20 0.49
KMT2A Q03164 3/20 0.49
GAA P10253 2/20 0.49
HTT P42858 1/20 0.49
ALDH1A1 P00352 2/20 0.48
CA2 P00918 1/20 0.46
CA5A P35218 1/20 0.46
MAPT P10636 2/20 0.46
KMO O15229 1/20 0.46
MEN1 O00255 1/20 0.46
MAPK1 P28482 1/20 0.46
POLB P06746 1/20 0.45
KDM4E B2RXH2 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Dinitrophenylene SCHEMBL27503833 0.97 CYP1A2 (0.57) CYP1A2CYP3A4CYP2C19TSHRACHE
Nitrobenzene SCHEMBL27503832 0.86 ACHE (0.53) CYP1A2CYP3A4CYP2C19TSHRACHE
Dinitrophenylene SCHEMBL28343244 0.86 KMT2A (0.57) TSHRACHELMNAGPR17NFE2L2
SCHEMBL1317032 0.83 KMT2A (0.66) TSHRACHELMNAKMT2AGAA
SCHEMBL28261651 0.81 KMT2A (0.64) TSHRACHELMNAKMT2AGAA
SCHEMBL31572348 0.79 GPR17 (0.72) CYP1A2CYP3A4CYP2C19TSHRACHE
SCHEMBL4838474 0.79 GPR17 (0.72) CYP1A2CYP3A4CYP2C19TSHRACHE
SCHEMBL2551504 0.79 CYP1A2 (0.61) CYP1A2CYP3A4CYP2C19TSHRACHE
Dinitrophenylene SCHEMBL9007683 0.78 TSHR (0.58) CYP1A2CYP3A4CYP2C19TSHRACHE
SCHEMBL27777922 0.78 PAX8 (0.50) CYP3A4TSHRKMT2AHTTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106249547-A Photocurable resin composition and use the photo-curable dry film of described compositions 信越化学工业株式会社 2016-12-21 CN disclosed