SCHEMBL28111695

SCHEMBL28111695

CC(C)c1cc(C(C)C)c2sc3ccccc3c(=O)c2c1CC(=O)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.39
GLA P06280 1/20 0.39
MAPT P10636 6/20 0.38
ALDH1A1 P00352 5/20 0.38
LMNA P02545 5/20 0.38
POLB P06746 4/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
HCRTR1 O43613 1/20 0.38
KMT2A Q03164 4/20 0.38
MEN1 O00255 3/20 0.38
GAA P10253 2/20 0.38
NPSR1 Q6W5P4 2/20 0.38
RAB9A P51151 2/20 0.37
PRNP P04156 1/20 0.37
HPGD P15428 1/20 0.37
RXFP1 Q9HBX9 1/20 0.37
MAOA P21397 1/20 0.37
MAOB P27338 1/20 0.37
RAD52 P43351 2/20 0.35
CYP1A2 P05177 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9003201 0.84 MAPT (0.41) KDM4EGLAMAPTALDH1A1LMNA
SCHEMBL28108085 0.78 MAPT (0.43) KDM4EMAPTALDH1A1LMNAPOLB
SCHEMBL29020437 0.73 MAPT (0.43) KDM4EMAPTALDH1A1LMNAPOLB
Benzophenone SCHEMBL28107994 0.72 MAPT (0.45) KDM4EMAPTALDH1A1LMNAPOLB
Acetophenone SCHEMBL28091583 0.71 MAPT (0.44) KDM4EMAPTALDH1A1LMNAPOLB
Benzophenone SCHEMBL5072184 0.71 GABRA1 (0.44) KDM4EMAPTALDH1A1LMNAPOLB
SCHEMBL11966910 0.71 MAPT (0.48) KDM4EMAPTALDH1A1LMNAPOLB
SCHEMBL10711560 0.70 MAOA (0.43) KDM4EGLAMAPTALDH1A1LMNA
SCHEMBL29876735 0.69 MAPT (0.41) KDM4EMAPTALDH1A1LMNAPOLB
SCHEMBL113420 0.69 ALDH1A1 (0.68) KDM4EMAPTALDH1A1LMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-103576452-B Light-curing thermal-curing resin composition 上海孚赛特新材料股份有限公司 2017-02-22 CN disclosed
CN-103576459-B A kind of photocuring and thermally curable resin composition SHANGHAI FUSAITE NEW MATERIAL CO., LTD. (CN) 2016-11-30 CN disclosed