Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MGLL | Q99685 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | AR | P10275 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | CNR1 | P21554 | 3/20 | 0.38 |
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | FDPS | P14324 | 1/20 | 0.37 |
| ▸ | MMP8 | P22894 | 1/20 | 0.37 |
| ▸ | MMP14 | P50281 | 1/20 | 0.37 |
| ▸ | CA9 | Q16790 | 1/20 | 0.37 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.37 |
| ▸ | MAOA | P21397 | 1/20 | 0.37 |
| ▸ | SMO | Q99835 | 1/20 | 0.37 |
| ▸ | KMO | O15229 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.35 |
| ▸ | CTSD | P07339 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL465339 | 0.86 | — | — | |
| Benzene SCHEMBL28686547 | 0.86 | ALDH1A1 (0.45) | ALDH1A1MEN1ARMAPTKMT2A | |
| SCHEMBL1358827 | 0.84 | ALDH1A1 (0.39) | MGLLALDH1A1MEN1KMT2ACTSD | |
| SCHEMBL27780348 | 0.84 | ALDH1A1 (0.43) | ALDH1A1MEN1ARMAPTKMT2A | |
| Hydrochloric Acid SCHEMBL29730399 | 0.84 | ALDH1A1 (0.43) | ALDH1A1MEN1ARMAPTKMT2A | |
| SCHEMBL27820487 | 0.84 | ALDH1A1 (0.43) | ALDH1A1MEN1ARMAPTKMT2A | |
| SCHEMBL28114925 | 0.82 | ALDH1A1 (0.43) | ALDH1A1MAPTMMP8MMP14CA14 | |
| SCHEMBL28126651 | 0.79 | TSHR (0.42) | ALDH1A1MEN1ARMAPTKMT2A | |
| SCHEMBL1476968 | 0.77 | MEN1 (0.43) | ALDH1A1MEN1MAPTCNR1KMO | |
| Hydrochloric Acid SCHEMBL1477133 | 0.76 | MEN1 (0.42) | ALDH1A1MEN1MAPTCNR1KMO |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12415892-B2 | Polyimide film preparation method and application thereof | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2025-09-16 | — | — | US | claimed |
| WO-2024216910-A1 | HIGH-CHEMICAL-RESISTANCE POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 明士(北京)新材料开发有限公司 | 2024-10-24 | — | — | WO | claimed |
| CN-117186403-B | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2024-04-02 | — | — | CN | claimed |
| CN-116836388-B | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-15 | — | — | CN | claimed |
| CN-117186403-A | Negative photosensitive resin, resin composition, and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-12-08 | — | — | CN | claimed |
| CN-116836388-A | Positive photosensitive resin, resin composition, preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-10-03 | — | — | CN | claimed |
| CN-116068852-B | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-07-14 | — | — | CN | claimed |
| CN-116068852-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2023-05-05 | — | — | CN | claimed |
| CN-114995061-B | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-114995060-B | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-11-01 | — | — | CN | claimed |
| CN-115220305-A | Positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-10-21 | — | — | CN | claimed |
| CN-114995061-A | Low-water-absorption positive photosensitive resin composition and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| CN-114995060-A | Negative photosensitive resin composition capable of being cured at low temperature and preparation method and application thereof | 明士(北京)新材料开发有限公司 | 2022-09-02 | — | — | CN | claimed |
| US-20220177650-A1 | POLYIMIDE FILM PREPARATION METHOD AND APPLICATION THEREOF | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2022-06-09 | — | — | US | claimed |
| CN-114280887-A | Negative photosensitive solid glue film developed by alkaline water system and preparation method thereof | 明士(北京)新材料开发有限公司 | 2022-04-05 | — | — | CN | claimed |
| WO-2020200229-A1 | POLYIMIDE THIN FILM AND PREPARATION METHOD AND APPLICATION THEREOF | 中国科学院化学研究所 | 2020-10-08 | — | — | WO | claimed |
| US-8993710-B1 | Polyimides derived from novel asymmetric benzophenone dianhydrides | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE ADMINISTRATOR OF NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) | 2015-03-31 | — | — | US | claimed |
| US-12415892-B2 | Polyimide film preparation method and application thereof | INSTITUTE OF CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2025-09-16 | — | — | US | disclosed |
| EP-0279921-A2 | Phenylacetylene-substituted schiff's base momomers and electroconductive polymers | National Starch and Chemical Investment Holding Corporation (US) | 1988-08-31 | — | — | EP | disclosed |
| US-4730032-A | MOLDING MATERIALS | NATIONAL STARCH AND CHEMICAL CORPORATION (US) | 1988-03-08 | — | — | US | disclosed |