Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX5 | P09917 | 1/20 | 0.46 |
| ▸ | ABCB11 | O95342 | 1/20 | 0.41 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29958337 | 0.81 | ALOX5 (0.47) | ALOX5 | |
| SCHEMBL28087108 | 0.79 | ABCB11 (0.37) | ABCB11TRPA1 | |
| SCHEMBL29366462 | 0.76 | PPARG (0.42) | ALOX5 | |
| SCHEMBL27652160 | 0.76 | ABCB11 (0.35) | ABCB11TRPA1 | |
| SCHEMBL10905964 | 0.76 | PPARG (0.42) | ALOX5 | |
| SCHEMBL8230027 | 0.75 | — | — | |
| SCHEMBL28254067 | 0.75 | ABCB11 (0.34) | ABCB11 | |
| SCHEMBL28087040 | 0.73 | ABCB11 (0.33) | ABCB11 | |
| SCHEMBL6673904 | 0.71 | ABCB11 (0.47) | ABCB11TRPA1 | |
| SCHEMBL4942202 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106462059-B | Resist material, resist composition, and resist pattern forming method | 三菱瓦斯化学株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-106957217-B | Polyhydric phenol compound for resist composition | 三菱瓦斯化学株式会社 | 2020-07-24 | — | — | CN | disclosed |
| CN-105264440-B | Anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2019-09-24 | — | — | CN | disclosed |
| CN-106133604-B | Protectant composition and protectant pattern forming method | 三菱瓦斯化学株式会社 | 2019-09-06 | — | — | CN | disclosed |
| CN-109690361-A | Optical component forms composition | 三菱瓦斯化学株式会社 | 2019-04-26 | — | — | CN | disclosed |
| CN-104737073-B | Anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2019-03-08 | — | — | CN | disclosed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-109073782-A | Optical element forms composition and its solidfied material | 三菱瓦斯化学株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-103733135-B | Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound | 三菱瓦斯化学株式会社 | 2018-11-27 | — | — | CN | disclosed |
| CN-108137478-A | Compound, resin, resist composition or radiation-sensitive composition, method for forming resist pattern, method for producing amorphous film, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for forming circuit pattern, and purification method | 三菱瓦斯化学株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-107407874-A | Radiation-sensitive composition, amorphous film and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2017-11-28 | — | — | CN | disclosed |
| CN-106957217-A | Polyphenol compound for anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2017-07-18 | — | — | CN | disclosed |
| CN-106462059-A | Resist material, resist composition, and resist pattern formation method | 三菱瓦斯化学株式会社 | 2017-02-22 | — | — | CN | disclosed |
| CN-106133604-A | Protectant composition and protectant pattern forming method | 三菱瓦斯化学株式会社 | 2016-11-16 | — | — | CN | disclosed |
| CN-105264440-A | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2016-01-20 | — | — | CN | disclosed |
| CN-104737073-A | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2015-06-24 | — | — | CN | disclosed |
| CN-104281006-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2015-01-14 | — | — | CN | disclosed |
| CN-103733135-A | Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound | MITSUBISHI GAS CHEMICAL CO | 2014-04-16 | — | — | CN | disclosed |
| CN-1942825-B | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2010-05-12 | — | — | CN | disclosed |
| CN-1942825-A | Resist composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-04-04 | — | — | CN | disclosed |