Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ABCB11 | O95342 | 1/20 | 0.35 |
| ▸ | TYR | P14679 | 1/20 | 0.30 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28087040 | 0.85 | ABCB11 (0.33) | ABCB11 | |
| SCHEMBL27652152 | 0.81 | ALOX15 (0.35) | TYR | |
| SCHEMBL12419206 | 0.79 | TYR (0.30) | TYR | |
| SCHEMBL28113616 | 0.76 | ALOX5 (0.46) | ABCB11TRPA1 | |
| SCHEMBL28087108 | 0.76 | ABCB11 (0.37) | ABCB11TRPA1 | |
| SCHEMBL28254067 | 0.72 | ABCB11 (0.34) | ABCB11 | |
| SCHEMBL12261475 | 0.69 | TYR (0.45) | TYR | |
| SCHEMBL12640556 | 0.69 | USP2 (0.37) | — | |
| SCHEMBL6673904 | 0.69 | ABCB11 (0.47) | ABCB11TRPA1 | |
| SCHEMBL6871223 | 0.68 | CA2 (0.40) | ABCB11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106462059-B | Resist material, resist composition, and resist pattern forming method | 三菱瓦斯化学株式会社 | 2020-07-28 | — | — | CN | disclosed |
| CN-106957217-B | Polyhydric phenol compound for resist composition | 三菱瓦斯化学株式会社 | 2020-07-24 | — | — | CN | disclosed |
| CN-109690361-A | Optical component forms composition | 三菱瓦斯化学株式会社 | 2019-04-26 | — | — | CN | disclosed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-107924123-A | Photoetching material and its manufacture method, photoetching composition, pattern formation method and, compound, resin and their purification process | 学校法人关西大学 | 2018-04-17 | — | — | CN | disclosed |
| CN-103946204-B | Cyclic compound, its manufacture method, radiation-sensitive composition and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2016-08-24 | — | — | CN | disclosed |
| CN-103717562-B | Cyclic compound, its manufacture method, compositions and corrosion-resisting pattern forming method | 三菱瓦斯化学株式会社 | 2016-08-24 | — | — | CN | disclosed |
| CN-105264440-A | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2016-01-20 | — | — | CN | disclosed |
| CN-104737073-A | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2015-06-24 | — | — | CN | disclosed |
| CN-104281006-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2015-01-14 | — | — | CN | disclosed |
| CN-103733135-A | Resist composition, method for forming resist pattern, polyphenol compound used for the same, and alcohol compound derived from the polyphenol compound | MITSUBISHI GAS CHEMICAL CO | 2014-04-16 | — | — | CN | disclosed |
| CN-1942825-B | Resist composition | MITSUBISHI GAS CHEMICAL CO | 2010-05-12 | — | — | CN | disclosed |
| CN-1942825-A | Resist composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-04-04 | — | — | CN | disclosed |