SCHEMBL28115946

SCHEMBL28115946

Cc1cc(C)c(OS(=O)(=O)c2ccccc2)c(C)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 2/20 0.51
ALPL P05186 1/20 0.49
TDP1 Q9NUW8 3/20 0.44
METAP2 P50579 1/20 0.43
TUBB4A P04350 1/20 0.43
TUBB P07437 1/20 0.43
TUBA3C P0DPH7 1/20 0.43
TUBA1B P68363 1/20 0.43
TUBA4A P68366 1/20 0.43
TUBB4B P68371 1/20 0.43
TUBB3 Q13509 1/20 0.43
TUBB2A Q13885 1/20 0.43
TUBB8 Q3ZCM7 1/20 0.43
TUBA3E Q6PEY2 1/20 0.43
TUBA1A Q71U36 1/20 0.43
TUBA1C Q9BQE3 1/20 0.43
TUBB6 Q9BUF5 1/20 0.43
TUBB2B Q9BVA1 1/20 0.43
TUBB1 Q9H4B7 1/20 0.43
MAOB P27338 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28584784 0.87 RAPGEF4 (0.53) FFAR4ALDH1A1MAPTKEAP1NFE2L2
SCHEMBL28229836 0.86 ALPL (0.47) FFAR4ALPLTDP1TUBB4ATUBB
SCHEMBL1286018 0.85 ALPL (0.48) ALPLTDP1METAP2TUBB4ATUBB
SCHEMBL3838606 0.84 ALPL (0.46) FFAR4ALPLTDP1TUBB4ATUBB
SCHEMBL3843547 0.84 ALPL (0.46) FFAR4ALPLTDP1TUBB4ATUBB
SCHEMBL19912237 0.83 ALPL (0.45) ALPLTDP1TUBB4ATUBBTUBA3C
SCHEMBL3842506 0.83 ALPL (0.45) FFAR4ALPLTDP1TUBB4ATUBB
SCHEMBL19917486 0.83 NPC1 (0.45) FFAR4ALPLTDP1TUBB4ATUBB
SCHEMBL15249770 0.82 RAPGEF4 (0.57) FFAR4TUBB4ATUBBTUBA3CTUBA1B
SCHEMBL8501897 0.80 ALPL (0.43) ALPLTDP1TUBB4ATUBBTUBA3C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106980235-A Chemically amplified photoresist composition and process for its use and its application method 国际商业机器公司 2017-07-25 CN disclosed
CN-102472971-B chemically amplified photoresist composition and method of use thereof 国际商业机器公司 2016-12-07 CN disclosed