SCHEMBL28124307

SCHEMBL28124307

C=C(C)C=CC(C)C.[Ru]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL134973 0.97
SCHEMBL134974 0.97
SCHEMBL28711857 0.94 ALDH1A1 (0.35)
SCHEMBL28717404 0.94
Isobutyraldehyde SCHEMBL27940123 0.87 GABRP (0.31)
Acetaldehyde SCHEMBL27940990 0.87 TAS1R3 (0.32)
SCHEMBL11568243 0.77
SCHEMBL11568240 0.77
SCHEMBL13651705 0.77
SCHEMBL21490456 0.75 ALDH1A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106459113-B The film deposition method of novel ruthenium compound, preparation method, the film deposition precursor composition comprising it and utilization precursor composition UP化学株式会社 2018-07-13 CN disclosed
CN-106459113-A Novel ruthenium compound, preparation method therefor, precursor composition for film deposition, containing same, and method for depositing film by using same UP化学株式会社 2017-02-22 CN disclosed