SCHEMBL281747

SCHEMBL281747

CC(C=O)CCC=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9440527 0.97
SCHEMBL10868404 0.97
SCHEMBL5136017 0.92 TSHR (0.44)
Sulfurous Acid SCHEMBL11298082 0.88 ALDH1A1 (0.31)
SCHEMBL17072234 0.86 AKR1B1 (0.37)
SCHEMBL3407797 0.85 ALDH1A1 (0.32)
SCHEMBL93310 0.83
Sulfurous Acid SCHEMBL11020860 0.82
Acrylic Acid SCHEMBL29910942 0.82 LMNA (0.40)
SCHEMBL10522037 0.81 TSHR (0.44)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 554 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260142180-A1 Binder for Secondary Battery, Negative Electrode for Secondary Battery Including the Same, and Lithium Secondary Battery Including the Same SK ON CO LTD (KR) 2026-05-21 US claimed
US-12612523-B2 Fireproof coating material WeiFang Jia Cheng Digital Materials Co., Ltd. (CN) 2026-04-28 US claimed
US-12555790-B2 Binder for secondary battery, negative electrode for secondary battery including the same, and lithium secondary battery including the same SK ON CO., LTD. (KR) 2026-02-17 US claimed
US-20250188600-A1 SIDEWALL PASSIVATION USING ALDEHYDE OR ISOCYANATE CHEMISTRY FOR HIGH ASPECT RATIO ETCH LAM RESEARCH CORPORATION 2025-06-12 US claimed
CN-118983416-A Spherical silicon-carbon anode material and preparation method thereof 合肥国轩新材料科技有限公司 2024-11-19 CN claimed
US-20240343921-A1 FIREPROOF COATING MATERIAL WeiFang Jia Cheng Digital Materials Co., Ltd. (CN) 2024-10-17 US claimed
CN-115007113-B Carbon dot-doped chitosan film and preparation and application thereof 中国科学院大连化学物理研究所 2024-04-23 CN claimed
EP-4335909-A1 FIRE-RESISTANT COATING MATERIAL Weifang Jia Cheng Digital Materials Co., Ltd. (CN) 2024-03-13 EP claimed
WO-2024021366-A1 FIRE-RESISTANT COATING MATERIAL 潍坊佳诚数码材料有限公司 2024-02-01 WO claimed
WO-2023177594-A1 SIDEWALL PASSIVATION USING ALDEHYDE OR ISOCYANATE CHEMISTRY FOR HIGH ASPECT RATIO ETCH LAM RESEARCH CORPORATION (US) 2023-09-21 WO claimed
EP-0710214-A1 THE USE OF DIALDEHYDES AND ACETALS THEREOF FOR INHIBITING DECOMPOSITION OF PEROXIDE IN THE PRODUCTION AND THE TREATMENT OF RECYCLED FIBER PULP AND OTHER FIBER PULP Cellkem Oy (FI) 1996-05-08 EP claimed
US-5389502-A Black and white photography; hydroquinone and auxiliary developers, dialdehyde hardeners, antifoggants, sulfites, oligomeric carboxyl sequestering agents EASTMAN KODAK COMPANY (US) 1995-02-14 US claimed
WO-1995000439-A1 THE USE OF DIALDEHYDES AND ACETALS THEREOF FOR INHIBITING DECOMPOSITION OF PEROXIDE IN THE PRODUCTION AND THE TREATMENT OF RECYCLED FIBER PULP AND OTHER FIBER PULP CELLKEM OY (FI) 1995-01-05 WO claimed
US-5217853-A Using automatic processor including functions of development, fixing, washing, and drying FUJI PHOTO FILM CO., LTD. (JP) 1993-06-08 US claimed
US-5139929-A Regenerating bleach-fixing solution and reusing, continuous FUJI PHOTO FILM CO., LTD. (JP) 1992-08-18 US claimed
EP-0430212-A1 Method for development processing of silver halide photosensitive materials FUJI PHOTO FILM CO., LTD. (JP) 1991-06-05 EP claimed
EP-0409276-A1 Method for processing a silver halide color photographic material FUJI PHOTO FILM CO., LTD. (JP) 1991-01-23 EP claimed
US-4532117-A Method for reconditioning bacteria-contaminated hydrogen sulfide removal systems UNION OIL COMPANY OF CALIFORNIA (US) 1985-07-30 US claimed
US-4082688-A PROCESS FOR PRODUCING MICROCAPSULES NCR CORPORATION (US) 1978-04-04 US claimed
US-3994729-A DIALDEHYDES, FIXING WITH THIOSULFATES, ALUMINUM SALT, TARTARIC ACID OR CITRIC ACID FUJI PHOTO FILM CO., LTD. (JA) 1976-11-30 US claimed