Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS1 | P29475 | 4/20 | 0.46 |
| ▸ | NOS2 | P35228 | 4/20 | 0.46 |
| ▸ | NOS3 | P29474 | 2/20 | 0.46 |
| ▸ | ABAT | P80404 | 1/20 | 0.40 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.38 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.37 |
| ▸ | LOXL2 | Q9Y4K0 | 4/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | P2RY6 | Q15077 | 1/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
| ▸ | PLAU | P00749 | 1/20 | 0.33 |
| ▸ | MAOB | P27338 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL707583 | 0.85 | CYP3A4 (0.34) | CYP3A4TSHRP2RY6 | |
| SCHEMBL28123936 | 0.83 | NOS3 (0.50) | NOS1NOS2NOS3ABATHRH3 | |
| SCHEMBL28207770 | 0.82 | NOS1 (0.41) | NOS1NOS2NOS3ABATHRH3 | |
| SCHEMBL18245040 | 0.78 | NOS3 (0.36) | NOS1NOS2NOS3CYP3A4TSHR | |
| SCHEMBL1009278 | 0.75 | MIF (0.44) | NOS1NOS2NOS3CYP3A4TSHR | |
| SCHEMBL12865537 | 0.74 | HSD17B10 (0.32) | — | |
| SCHEMBL16192966 | 0.71 | P2RY6 (0.68) | NOS1NOS2NOS3ABATHRH3 | |
| SCHEMBL14257216 | 0.71 | CYP3A4 (0.68) | NOS1NOS2NOS3ABATHRH3 | |
| SCHEMBL27549378 | 0.71 | NOS3 (0.47) | NOS1NOS2NOS3ABATHRH3 | |
| SCHEMBL962927 | 0.70 | PLAU (0.50) | CYP3A4TSHRP2RY6TAAR1PLAU |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107848963-A | Alkali-producing agent and/or radical-generating agent having acid resistance, and curable resin composition containing same | 和光纯药工业株式会社 | 2018-03-27 | — | — | CN | disclosed |