Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.48 |
| ▸ | CA2 | P00918 | 1/20 | 0.48 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 4/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.37 |
| ▸ | MAPT | P10636 | 4/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.37 |
| ▸ | HPGD | P15428 | 3/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.37 |
| ▸ | MAOA | P21397 | 2/20 | 0.37 |
| ▸ | APEX1 | P27695 | 2/20 | 0.37 |
| ▸ | RECQL | P46063 | 2/20 | 0.37 |
| ▸ | TP53 | P04637 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | USP2 | O75604 | 2/20 | 0.37 |
| ▸ | RAF1 | P04049 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethane SCHEMBL28865517 | 0.86 | CA1 (0.50) | CA1CA2ACHEMEN1KMT2A | |
| SCHEMBL5526665 | 0.84 | CA1 (0.52) | CA1CA2ACHEMEN1KMT2A | |
| SCHEMBL27981275 | 0.82 | CA1 (0.54) | CA1CA2ACHEMEN1KMT2A | |
| SCHEMBL8895164 | 0.78 | CA1 (0.54) | CA1CA2ACHEMEN1KMT2A | |
| Ethane SCHEMBL27498775 | 0.76 | CA1 (0.52) | CA1CA2GAAALOX5HSD17B1 | |
| SCHEMBL28807872 | 0.76 | CA1 (0.46) | CA1CA2ACHEMEN1KMT2A | |
| SCHEMBL7523283 | 0.75 | CA1 (0.56) | CA1CA2ACHEMEN1KMT2A | |
| SCHEMBL5533089 | 0.75 | KDM4E (0.40) | CA1CA2ACHEMEN1KMT2A | |
| SCHEMBL2026463 | 0.74 | CA1 (0.50) | CA1CA2ACHEMEN1KMT2A | |
| SCHEMBL5528708 | 0.74 | CA1 (0.54) | CA1CA2ACHEMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105425545-B | Positive photosensitive resin composition and use thereof | 奇美实业股份有限公司 | 2019-11-08 | — | — | CN | disclosed |
| CN-110426917-A | Photosensitive laminate and its manufacturing method | ASAHI KASEI CORP | 2019-11-08 | — | — | CN | disclosed |
| CN-106795258-B | Phenolic hydroxy group resin, preparation method, photonasty or solidification compound, erosion resistant, film, solidfied material and resist lower membrane | DIC株式会社 | 2019-11-08 | — | — | CN | disclosed |
| CN-110317174-A | Hydrogen barrier, hydrogen barrier film, which are formed, uses composition, hydrogen barrier film, the manufacturing method of hydrogen barrier film and electronic component | 东京应化工业株式会社 | 2019-10-11 | — | — | CN | disclosed |
| CN-105093832-B | Photosensitive composition, protective film and element having protective film | 奇美实业股份有限公司 | 2019-08-30 | — | — | CN | disclosed |
| CN-104076607-B | Eurymeric anti-corrosion agent composition | 东京应化工业株式会社 | 2019-07-23 | — | — | CN | disclosed |
| CN-104423170-B | Photosensitive polysiloxane composition, protective film and assembly with protective film | 奇美实业股份有限公司 | 2019-05-24 | — | — | CN | disclosed |
| CN-109790263-A | phenolic hydroxyl group-containing resin and resist material | DIC株式会社 | 2019-05-21 | — | — | CN | disclosed |
| CN-105190439-B | Modified novolac type phenolic resin, erosion resistant, film and permanent film against corrosion | DIC株式会社 | 2019-05-17 | — | — | CN | disclosed |
| CN-104345567-B | photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2019-04-02 | — | — | CN | disclosed |
| CN-104649580-B | The processing method of chemically reinforced glass substrate | 东京应化工业株式会社 | 2019-01-04 | — | — | CN | disclosed |
| CN-109071744-A | Novolac resin and resist material | DIC株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-109062007-A | positive photosensitive polysiloxane composition and application thereof | 奇美实业股份有限公司 | 2018-12-21 | — | — | CN | disclosed |
| CN-104423168-B | Positive photosensitive resin composition and pattern forming method thereof | 奇美实业股份有限公司 | 2018-11-30 | — | — | CN | disclosed |
| CN-108884574-A | Coating agent for forming metal oxide film and method for producing substrate having metal oxide film | 东京应化工业株式会社 | 2018-11-23 | — | — | CN | disclosed |
| CN-108693710-A | Positive photosensitive polysiloxane composition | 奇美实业股份有限公司 | 2018-10-23 | — | — | CN | disclosed |
| CN-108368214-A | NOVOLAC RESIN AND RESIST FILM | DIC株式会社 | 2018-08-03 | — | — | CN | disclosed |
| CN-108368213-A | Phenolic varnish type resin and etchant resist | DIC株式会社 | 2018-08-03 | — | — | CN | disclosed |
| CN-108290991-A | Resin containing phenolic hydroxyl group and etchant resist | DIC株式会社 | 2018-07-17 | — | — | CN | disclosed |
| CN-105555820-B | Manufacturing method, photosensitive composite, erosion resistant and the film of modified hydroxyl naphthol novolak varnish gum, modified hydroxyl naphthol novolak varnish gum | DIC株式会社 | 2018-06-29 | — | — | CN | disclosed |