Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.52 |
| ▸ | CA2 | P00918 | 1/20 | 0.52 |
| ▸ | ELANE | P08246 | 5/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | CTSG | P08311 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.38 |
| ▸ | PTGS1 | P23219 | 3/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.38 |
| ▸ | G6PD | P11413 | 2/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 3/20 | 0.36 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.36 |
| ▸ | USP2 | O75604 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5533089 | 0.85 | KDM4E (0.40) | CA1CA2ELANEALDH1A1CTSG | |
| SCHEMBL8895164 | 0.85 | CA1 (0.54) | CA1CA2ELANEALDH1A1ACHE | |
| Ethane SCHEMBL28219675 | 0.84 | CA1 (0.48) | CA1CA2ALDH1A1ACHEMEN1 | |
| SCHEMBL7523283 | 0.83 | CA1 (0.56) | CA1CA2ALDH1A1ACHEMEN1 | |
| SCHEMBL922255 | 0.83 | CA1 (0.56) | CA1CA2ELANEALDH1A1MEN1 | |
| SCHEMBL16195323 | 0.79 | HSD17B1 (0.44) | ELANEALDH1A1CTSGG6PDKDM4E | |
| SCHEMBL5531038 | 0.78 | PTPN5 (0.36) | CA1CA2ELANEMEN1KMT2A | |
| Ethane SCHEMBL28865517 | 0.78 | CA1 (0.50) | CA1CA2ELANEALDH1A1CTSG | |
| SCHEMBL2026463 | 0.78 | CA1 (0.50) | CA1CA2ALDH1A1ACHEMEN1 | |
| SCHEMBL27524726 | 0.77 | ALDH1A1 (0.61) | CA1CA2ELANEALDH1A1CTSG |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 50 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | claimed |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | DIC CORPORATION (JP) | 2020-03-03 | — | — | US | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| US-10067422-B2 | Photosensitive resin composition for forming interlayer insulating film, interlayer insulating film, and method for forming interlayer insulating film | TOKYO OHKA KOGYO CO. LTD. (JP) | 2018-09-04 | — | — | US | disclosed |
| US-9975830-B2 | Compound containing modified phenolic hydroxy group, method for producing compound containing modified phenolic hydroxy group, photosensitive composition, resist material, and resist coating film | DIC CORPORATION (JP) | 2018-05-22 | — | — | US | disclosed |
| US-20180134834-A1 | PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM | DIC CORPORATION (JP) | 2018-05-17 | — | — | US | disclosed |
| US-9963536-B2 | Phenolic hydroxyl group-containing resin, production method therefor, photosensitive composition, resist material, coating film, curable composition and cured product thereof, and resist underlayer film | DIC CORPORATION (JP) | 2018-05-08 | — | — | US | disclosed |
| US-9851638-B2 | Photosensitive polysiloxane composition and uses thereof | CHI MEI CORPORATION (TW) | 2017-12-26 | — | — | US | disclosed |
| US-9765175-B2 | Modified hydroxy naphthalene novolak resin, production method for modified hydroxy naphthalene novolak resin, photosensitive composition, resist material and coating | DIC CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-20170255099-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR FORMING INTERLAYER INSULATING FILM, INTERLAYER INSULATING FILM, AND METHOD FOR FORMING INTERLAYER INSULATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-09-07 | — | — | US | disclosed |
| US-5856058-A | HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-01-05 | — | — | US | disclosed |
| US-5686455-A | Imidazole derivatives and their use as cytokine inhibitors | SMITHKLINE BEECHAM CORPORATION (US) | 1997-11-11 | — | — | US | disclosed |
| US-5677102-A | DISSOLVING AN ALKALI SOLUBLE RESIN AND A QUINONEDIAZIDE GROUP CONTAINING COMPOUND; HEATING | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-10-14 | — | — | US | disclosed |
| US-5604077-A | MIXTURE OF ALKALI-SOLUBLE NOVOLAK AND A QUINONE DIAZIDE PHOTOSENSITIZER; HEAT RESISTANCE, RESOLUTION, ANTIFOULING AGENTS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-18 | — | — | US | disclosed |
| US-5601961-A | QUINONE DIAZIDE GROUP-CONTAINING COMPOUND AS PHOTOSENSITIZING AGENT, ALKALI-SOLUBLE RESINOUS INGREDIENT AS FILM-FORMING AGENT MADE FROM A BLEND OF AT LEAST TWO NOVOLAK-TYPE RESINS FROM M-AND P-CRESOL, A XYLENOL AND A TRIMETHYLPHENOL | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-02-11 | — | — | US | disclosed |
| US-5576138-A | MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-11-19 | — | — | US | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | disclosed |
| US-5332647-A | Photosensitive resins for elements | TOKYO OHKA KOGYO CO., LTD. (JP) | 1994-07-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180134834-A1 | PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM | HACL2, ASH2L, HEATR1 | CA1 3444/4885CA2 3632/4885ELANE 4303/4885 |
| US-10577449-B2 | Phenolic-hydroxyl-group-containing novolac resin and resist film | HACL2, ASH2L, HEATR1 | CA1 3444/4885CA2 3632/4885ELANE 4303/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.