SCHEMBL5533089

SCHEMBL5533089

Cc1cc(-c2ccc(C)c(O)c2-c2cc(C)c(O)c(C)c2)cc(C)c1O.Cc1cc(-c2ccc(C)c(O)c2-c2cc(C)c(O)cc2C)c(C)cc1O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.40
MAPT P10636 3/20 0.40
ALDH1A1 P00352 3/20 0.40
HPGD P15428 2/20 0.40
G6PD P11413 2/20 0.40
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2D6 P10635 1/20 0.40
CYP2C9 P11712 1/20 0.40
PKM P14618 1/20 0.40
ALOX15 P16050 1/20 0.40
ALOX12 P18054 1/20 0.40
MAPK1 P28482 1/20 0.40
CYP2C19 P33261 1/20 0.40
CCR6 P51684 1/20 0.40
HIF1A Q16665 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
HSD17B10 Q99714 1/20 0.40
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4950434 0.89 KDM4E (0.50) KDM4EMAPTALDH1A1HPGDG6PD
SCHEMBL5526665 0.85 CA1 (0.52) KDM4EMAPTALDH1A1HPGDG6PD
Ethane SCHEMBL28289826 0.77 KDM4E (0.48) KDM4EMAPTALDH1A1HPGDG6PD
SCHEMBL18941006 0.77 CA1 (0.39) KDM4EMAPTALDH1A1HPGDG6PD
SCHEMBL8894430 0.75 KDM4E (0.50) KDM4EMAPTALDH1A1HPGDG6PD
Ethane SCHEMBL28219675 0.75 CA1 (0.48) KDM4EMAPTALDH1A1HPGDG6PD
SCHEMBL758291 0.75 KDM4E (0.48) KDM4EMAPTALDH1A1HPGDG6PD
SCHEMBL16195323 0.74 HSD17B1 (0.44) KDM4EMAPTALDH1A1HPGDG6PD
SCHEMBL8895164 0.73 CA1 (0.54) KDM4EMAPTALDH1A1HPGDG6PD
SCHEMBL7523283 0.70 CA1 (0.56) KDM4EMAPTALDH1A1HPGDG6PD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070248905-A1 TWO-LAYER FILM AND METHOD OF FORMING PATTERN WITH THE SAME JSR CORPORATION (JP) 2007-10-25 US disclosed