Tectoquinone

Tectoquinone

SCHEMBL28235019

Cc1ccc2c(c1)C(=O)c1ccccc1C2=O.O=C1c2ccccc2C(=O)c2c(Cl)cccc21.O=C1c2ccccc2C(=O)c2cc(Cl)ccc21.O=C1c2ccccc2C(=O)c2ccccc21.[CH2]C

nearest known ligand 0.57

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ELANE P08246 2/20 0.57
▸ S100A4 P26447 2/20 0.51
▸ POLB P06746 1/20 0.44
▸ LCK P06239 1/20 0.43
▸ MAOA P21397 1/20 0.42
▸ MAOB P27338 1/20 0.42
▸ ITGA1 P56199 1/20 0.42
▸ NSD2 O96028 1/20 0.41
▸ CYP1A1 P04798 1/20 0.40
▸ CYP1A2 P05177 1/20 0.40
▸ MAPT P10636 2/20 0.40
▸ NPC1 O15118 1/20 0.40
▸ ALDH1A1 P00352 1/20 0.40
▸ CYP3A4 P08684 1/20 0.40
▸ TSHR P16473 1/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ CASP3 P42574 1/20 0.40
▸ RAB9A P51151 1/20 0.40
▸ HBB P68871 1/20 0.40
▸ SMN1; SMN2 Q16637 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30610015 0.90 ELANE (0.65) ELANEPOLBLCKMAOAMAOB
SCHEMBL26187277 0.90 ELANE (0.65) ELANEPOLBLCKMAOAMAOB
Anthraquinone SCHEMBL28163374 0.89 S100A4 (0.65) ELANES100A4MAOAMAOBITGA1
SCHEMBL6906411 0.87 S100A4 (0.61) S100A4MAOAMAOBITGA1NSD2
SCHEMBL31375388 0.87 S100A4 (0.61) S100A4MAOAMAOBITGA1NSD2
SCHEMBL6899117 0.87 S100A4 (0.61) S100A4MAOAMAOBITGA1NSD2
Tectoquinone SCHEMBL11591324 0.85 ELANE (0.78) ELANES100A4POLBLCKMAOA
SCHEMBL2144503 0.84 ELANE (0.75) ELANES100A4POLBLCKMAOA
SCHEMBL11215973 0.81 ELANE (0.67) ELANES100A4LCKMAOAMAOB
SCHEMBL11215991 0.81 ELANE (0.67) ELANES100A4LCKMAOAMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104725558-B The method that photic acid generates copolymer and relevant photoetching compositions, the base material of coating and formation electronic device 罗门哈斯电子材料有限公司 2018-07-27 — — CN disclosed
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