Pyrrole

Pyrrole

SCHEMBL28243167

ClC(Cl)(Cl)c1nnc(C=Cc2ccccc2)o1.c1cc[nH]c1

nearest known ligand 0.46

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HPGD P15428 5/20 0.46
KMT2A Q03164 5/20 0.46
CYP1A2 P05177 4/20 0.46
L3MBTL1 Q9Y468 4/20 0.46
CYP2C19 P33261 3/20 0.46
ALDH1A1 P00352 3/20 0.46
MEN1 O00255 3/20 0.46
CYP2C9 P11712 3/20 0.46
CYP2D6 P10635 2/20 0.46
NPSR1 Q6W5P4 2/20 0.46
TDP1 Q9NUW8 2/20 0.46
NPY1R P25929 1/20 0.46
NPY2R P49146 1/20 0.46
KDM4E B2RXH2 6/20 0.43
SMN1; SMN2 Q16637 4/20 0.43
NPC1 O15118 4/20 0.43
RAB9A P51151 4/20 0.43
MAPT P10636 2/20 0.43
POLB P06746 1/20 0.40
GFER P55789 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL195496 0.91 HPGD (0.49) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL195495 0.91 HPGD (0.49) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL321610 0.90 HPGD (0.48) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL321609 0.90 HPGD (0.48) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
Imidazole SCHEMBL28342307 0.85 HPGD (0.39) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL1058172 0.85 CYP1A2 (0.48) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL195260 0.77 METAP2 (0.46) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL195259 0.77 METAP2 (0.46) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL195928 0.77 KDM4E (0.50) HPGDKMT2ACYP1A2L3MBTL1CYP2C19
SCHEMBL195929 0.77 KDM4E (0.50) HPGDKMT2ACYP1A2L3MBTL1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108508699-A Photosensitive polymer combination, photomask, liquid crystal display and its manufacturing method 新日铁住金化学株式会社 2018-09-07 CN disclosed