SCHEMBL28263221

SCHEMBL28263221

[c]1ccc(Oc2ccccc2-c2ccccc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NCOA1 Q15788 1/20 0.62
NCOA3 Q9Y6Q9 1/20 0.62
PTGS2 P35354 1/20 0.50
AR P10275 1/20 0.46
FFAR4 Q5NUL3 2/20 0.44
BRD4 O60885 3/20 0.44
MAPK1 P28482 2/20 0.41
TP53 P04637 1/20 0.41
RAB9A P51151 1/20 0.41
FFAR1 O14842 1/20 0.40
SCN9A Q15858 1/20 0.40
HRH1 P35367 1/20 0.39
HTR7 P34969 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
FABP7 O15540 1/20 0.37
FABP3 P05413 1/20 0.37
FABP5 Q01469 1/20 0.37
ADRB2 P07550 1/20 0.37
ALDH1A1 P00352 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3990509 0.92 NCOA1 (0.58) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL1958156 0.86 NCOA1 (0.74) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL6099374 0.82 NCOA1 (0.51) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL10755935 0.82 NCOA1 (0.69) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL9208935 0.82 NCOA1 (0.75) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL7791391 0.82 NCOA1 (0.69) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL5998891 0.81 LTA4H (0.50) MAPK1HRH1L3MBTL1ALDH1A1HTT
SCHEMBL28867387 0.80 NCOA1 (0.53) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL8129827 0.79 NCOA1 (0.47) NCOA1NCOA3PTGS2ARFFAR4
SCHEMBL112422 0.79 NCOA1 (0.63) NCOA1NCOA3PTGS2ARFFAR4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109071693-A Resin combination is used in the formation of high refractive index cured film 日产化学株式会社 2018-12-21 CN disclosed