SCHEMBL28278720

SCHEMBL28278720

C1=CC1.Oc1ccc(C(c2ccc(O)cc2)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.82

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 10/20 0.82
ESR2 Q92731 10/20 0.82
KIF11 P52732 1/20 0.46
CYP3A4 P08684 3/20 0.41
LMNA P02545 2/20 0.41
TYR P14679 2/20 0.41
HPGD P15428 2/20 0.41
HSD17B10 Q99714 2/20 0.41
AR P10275 1/20 0.41
TSHR P16473 1/20 0.41
SLC6A2 P23975 1/20 0.41
SLC6A4 P31645 1/20 0.41
HTR6 P50406 1/20 0.41
ESRRG P62508 1/20 0.41
SLC6A3 Q01959 1/20 0.41
ALDH1A1 P00352 2/20 0.36
KDM4E B2RXH2 1/20 0.36
MEN1 O00255 1/20 0.36
NPC1 O15118 1/20 0.36
CA12 O43570 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4560440 0.91 ESR1 (1.00) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL3686864 0.91 ESR1 (1.00) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL21027 0.91 ESR1 (1.00) ESR1ESR2KIF11CYP3A4LMNA
Potassium SCHEMBL30701764 0.88 ESR1 (0.95) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL30625966 0.88 ESR1 (0.95) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL7935379 0.84 ESR1 (0.86) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL10906373 0.84 ESR1 (0.86) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL6059489 0.84 ESR1 (0.86) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL6059770 0.84 ESR1 (0.86) ESR1ESR2KIF11CYP3A4LMNA
SCHEMBL8488305 0.82 ESR1 (0.82) ESR1ESR2KIF11CYP3A4LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110325501-A Compound, resin, composition, pattern forming method and purification process 三菱瓦斯化学株式会社 2019-10-11 CN disclosed
CN-110198924-A Compound, resin, composition and pattern forming method 三菱瓦斯化学株式会社 2019-09-03 CN disclosed
CN-110023277-A Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-07-16 CN disclosed
CN-110023276-A Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-07-16 CN disclosed
CN-109803950-A Compound, resin and composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-05-24 CN disclosed
CN-109790097-A Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-05-21 CN disclosed
CN-109715591-A Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-05-03 CN disclosed
CN-109715592-A Compound, resin, composition and pattern forming method 三菱瓦斯化学株式会社 2019-05-03 CN disclosed
CN-109476580-A Compound, resin, composition and pattern forming method 三菱瓦斯化学株式会社 2019-03-15 CN disclosed
CN-109476576-A Compound, resin, composition, resist pattern forming method, and circuit pattern forming method 三菱瓦斯化学株式会社 2019-03-15 CN disclosed
CN-109476575-A Compound, resin, composition and corrosion-resisting pattern forming method and circuit pattern forming method 三菱瓦斯化学株式会社 2019-03-15 CN disclosed
CN-109415286-A COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-03-01 CN disclosed