SCHEMBL2829358

SCHEMBL2829358

CC(C)(C)OC(=O)CC(O)(CC(=O)OC(C)(C)C)C(=O)OC(C)(C)C

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.41
CYP2D6 P10635 1/20 0.33
HMGCR P04035 1/20 0.32
CHRM1 P11229 1/20 0.32
TBXA2R P21731 1/20 0.32
ADRA1A P35348 1/20 0.32
HDAC1 Q13547 2/20 0.32
HDAC2 Q92769 2/20 0.32
HDAC6 Q9UBN7 2/20 0.32
HDAC3 O15379 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
CA12 O43570 1/20 0.31
CA2 P00918 1/20 0.31
CA14 Q9ULX7 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9249653 0.92 ALDH1A1 (0.41) DGAT1CYP2D6HMGCRCHRM1TBXA2R
SCHEMBL28483044 0.87 DGAT1 (0.48) DGAT1CYP2D6HMGCRCHRM1TBXA2R
SCHEMBL28483049 0.84 DGAT1 (0.45) DGAT1CYP2D6CA12CA2CA14
SCHEMBL9249667 0.82 ALDH1A1 (0.48) DGAT1CYP2D6HMGCRCHRM1TBXA2R
SCHEMBL18196451 0.82 ALDH1A1 (0.48) DGAT1CYP2D6HMGCRCHRM1TBXA2R
SCHEMBL10295968 0.82 DGAT1 (0.41) DGAT1HMGCRCHRM1TBXA2RADRA1A
SCHEMBL10339935 0.78 PIK3CD (0.40) DGAT1CYP2D6HMGCRCHRM1TBXA2R
SCHEMBL10939959 0.78 HMGCR (0.48) DGAT1CYP2D6HMGCRCHRM1TBXA2R
SCHEMBL20377364 0.78 ALDH1A1 (0.36) CYP2D6HMGCRCHRM1TBXA2RADRA1A
SCHEMBL2957588 0.78 ALDH1A1 (0.36) DGAT1CYP2D6HMGCRCHRM1TBXA2R

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108289808-B Artificial sweat composition 西姆莱斯股份公司 2022-06-07 CN claimed
US-20220106440-A1 METHOD TO PREPARE BRANCHED POLYMERS OF LACTIC ACID BIO VALORE WORLD S.P.A. SOCIETA' BENEFIT (IT) 2022-04-07 US claimed
CN-113785001-A Process for preparing branched polymers of lactic acid 生物价值世界福利公司 2021-12-10 CN claimed
CN-113582839-A Waterless washing process for DOP production 安徽力天环保科技股份有限公司 2021-11-02 CN claimed
CN-109021843-B Impact-resistant low-whitening instant adhesive and preparation method thereof 得力集团有限公司 2021-08-06 CN claimed
CN-109280112-B Catalyst composition suitable for propylene homopolymerization or copolymerization 任丘市利和科技发展有限公司 2021-06-08 CN claimed
EP-3094176-A1 ANTIMICROBIAL COMPOSITIONS FOR FOOD PACKAGING CONSISTING OF SALICYLALDEHYDE AND CARVACROL, THYMOL OR THEIR MIXTURE INSTITUTO TECNOLÓGICO DEL EMBALAJE, TRANSPORTE Y LOGÍSTICA (ITENE) (ES) 2016-11-23 EP claimed
US-20160325911-A1 ANTIMICROBIAL COMPOSITIONS FOR FOOD PACKAGING CONSISTING OF SALICYLALDEHYDE AND CARVACROL, THYMOL OR THEIR MIXTURE INSTITUO TECHNOLOGICO DEL EMBALAJE TRANSPORTE Y LOGISTICA (ITENE) (ES) 2016-11-10 US claimed
WO-2015107089-A1 ANTIMICROBIAL COMPOSITIONS FOR FOOD PACKAGING CONSISTING OF SALICYLALDEHYDE AND CARVACROL, THYMOL OR THEIR MIXTURE INSTITUTO TECNOLÓGICO DEL EMBALAJE, TRANSPORTE Y LOGÍSTICA (ITENE) (ES) 2015-07-23 WO claimed
EP-4574870-A1 BLOCKED POLYISOCYANATE Covestro Deutschland AG (DE) 2025-06-25 EP disclosed
CN-119331144-A Catalyst component for olefin polymerization, catalyst and application thereof 中国石油天然气股份有限公司 2025-01-21 CN disclosed
CN-115337940-B Preparation method and application of catalyst for synthesizing triisobutyl citrate 江苏理工学院 2023-12-15 CN disclosed
CN-115337940-A Preparation method and application of catalyst for synthesizing triisobutyl citrate 江苏理工学院 2022-11-15 CN disclosed
CN-108289808-B Artificial sweat composition 西姆莱斯股份公司 2022-06-07 CN disclosed
US-20050123867-A1 Silver halide elements containing activated precursors to thiocyanato stabilizers EASTMAN KODAK COMPANY 2005-06-09 US disclosed
US-6686143-B1 Silver halide photographic elements containing bis Au(I) sensitizers EASTMAN KODAK COMPANY 2004-02-03 US disclosed
US-6582878-B2 Coating on substrate chemical amplification resist comprising alkali-soluble base resin, photoacid generator and dissolution inhibitor, exposing coating to patterning radiation to decompose dissolution inhibitor, developing with aqueous base FUJITSU LIMITED (JP) 2003-06-24 US disclosed
US-20030073027-A1 Chemical amplification resist compositions and process for the formation of resist patterns FUJITSU LIMITED (JP) 2003-04-17 US disclosed
US-6200724-B1 CHEMICAL AMPLIFICATION RESIST COMPRISES AN ALKALI-SOLUBLE BASE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION INHIBITOR, IN WHICH A CYCLIC STRUCTURE FORMS A MATRIX PORTION CONTAINS ONE LONE PAIR CONTAINING PORTION FUJITSU LIMITED (JP) 2001-03-13 US disclosed
US-5391771-A Reacting citric acid or esters on hydrogenation catalyst in nonaqueous solvent BASF AKTIENGESELLSCHAFT 1995-02-21 US disclosed