SCHEMBL2829659

SCHEMBL2829659

CCOCC=C(C)C(N)=O

nearest known ligand 0.36

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 1/20 0.36
ALDH1A1 P00352 2/20 0.35
TSHR P16473 1/20 0.35
LMNA P02545 1/20 0.32
HSD17B10 Q99714 1/20 0.32
THRB P10828 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2301866 0.83 CES2 (0.31) ALDH1A1HSD17B10
SCHEMBL454527 0.80 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL3672318 0.80 ALDH1A1 (0.41) ALDH1A1TSHR
SCHEMBL211093 0.80 ALDH1A1 (0.37) ALDH1A1TSHRLMNAHSD17B10THRB
Ether SCHEMBL11078568 0.79 ALOX15 (0.40) ALOX15ALDH1A1TSHRLMNAHSD17B10
SCHEMBL3692623 0.79 MAPT (0.34) TSHR
SCHEMBL554002 0.79 ALDH1A1 (0.42) ALOX15ALDH1A1TSHRLMNAHSD17B10
SCHEMBL554001 0.79 ALDH1A1 (0.42) ALOX15ALDH1A1TSHRLMNAHSD17B10
SCHEMBL7595709 0.78 TSHR (0.34) TSHR
SCHEMBL4038150 0.78 TSHR (0.34) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111574656-B Fluorine-containing photosensitive resin for black matrix photoresist and resin composition thereof 江苏博砚电子科技有限公司 2022-04-22 CN claimed
CN-114384759-A Florenol acrylate for black matrix photoresist, preparation method thereof, resin composition and application method 江苏博砚电子科技有限公司 2022-04-22 CN claimed
CN-114380937-A Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof 江苏博砚电子科技有限公司 2022-04-22 CN claimed
CN-111574656-A Fluorine-containing photosensitive resin for black matrix photoresist and resin composition thereof 江苏博砚电子科技有限公司 2020-08-25 CN claimed
JP-5216283-A None JP disclosed
WO-2023085390-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2023-05-19 WO disclosed
CN-114384759-A Florenol acrylate for black matrix photoresist, preparation method thereof, resin composition and application method 江苏博砚电子科技有限公司 2022-04-22 CN disclosed
CN-114380937-A Adamantane-containing photosensitive resin for black matrix photoresist, preparation method thereof, resin composition and application method thereof 江苏博砚电子科技有限公司 2022-04-22 CN disclosed
WO-2020145175-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2020-07-16 WO disclosed
WO-2020138259-A1 LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM, LIQUID CRYSTAL DISPLAY ELEMENT, AND NOVEL MONOMER 日産化学株式会社 2020-07-02 WO disclosed
WO-2020045549-A1 LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2020-03-05 WO disclosed
WO-2020045548-A1 METHOD FOR PRODUCING LIQUID CRYSTAL ALIGNMENT FILM, LIQUID CRYSTAL ALIGNMENT FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT 日産化学株式会社 2020-03-05 WO disclosed
JP-H05216283-A ELECTROPHOTOGRAPHIC CARRIER MINOLTA CAMERA CO LTD 1993-08-27 JP disclosed
EP-0156208-B1 AQUEOUS DISPERSIONS FOR THE MANUFACTURE OF CROSS-LINKABLE COATINGS HOECHST AKTIENGESELLSCHAFT (DE) 1993-02-17 EP disclosed
US-5008155-A Bake-coating a dispersion at a temperature below minimum film-forming; then, bake-crosslinking at a temperature higher than its glass transition one; noncracking polyacrylates HOECHST AKTIENGESELLSCHAFT (DE) 1991-04-16 US disclosed
EP-0155589-B1 PROCESS FOR PRODUCING COATINGS ON SURFACES OF SOLID MATERIALS BY BAKING HOECHST AKTIENGESELLSCHAFT (DE) 1989-07-26 EP disclosed
EP-0283990-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-09-28 EP disclosed
US-4610898-A Process for bake coating the surfaces of solid substances HOECHST AKTIENGESELLSCHAFT (DE) 1986-09-09 US disclosed
EP-0156208-A2 Aqueous dispersions for the manufacture of cross-linkable coatings HOECHST AKTIENGESELLSCHAFT (DE) 1985-10-02 EP disclosed
US-4525510-A Thermosetting latex coating compositions produced by copolymerization in aqueous emulsion in the presence of water-insoluble polyhydric alcohol DESOTO, INC. (US) 1985-06-25 US disclosed