Benzoin

Benzoin

SCHEMBL28307199

C=CCc1ccccc1C(=O)C(O)c1ccccc1.O=C(c1ccccc1)C(O)c1ccccc1

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.58
CES2 O00748 3/20 0.58
CES1 P23141 3/20 0.58
KDM4E B2RXH2 2/20 0.44
ALDH1A1 P00352 1/20 0.44
TDP1 Q9NUW8 1/20 0.40
L3MBTL1 Q9Y468 1/20 0.40
CYP2C19 P33261 1/20 0.39
MAPK1 P28482 1/20 0.39
HPGD P15428 1/20 0.36
POLB P06746 1/20 0.35
ELANE P08246 1/20 0.35
PPARG P37231 1/20 0.35
PPARA Q07869 1/20 0.35
ALKBH5 Q6P6C2 1/20 0.35
CTNNB1 P35222 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzene SCHEMBL28209572 0.94 LMNA (0.47) LMNACES2CES1KDM4EALDH1A1
SCHEMBL324910 0.94 LMNA (0.47) LMNACES2CES1KDM4EALDH1A1
Benzil SCHEMBL28225728 0.93 LMNA (0.49) LMNACES2CES1KDM4EALDH1A1
Methoxymethane SCHEMBL11091635 0.89 LMNA (0.42) LMNACES2CES1KDM4EALDH1A1
Ether SCHEMBL11098722 0.85 LMNA (0.40) LMNACES2CES1KDM4EALDH1A1
SCHEMBL29014396 0.83 LMNA (0.42) LMNACES2CES1KDM4EALDH1A1
SCHEMBL31250054 0.83 LMNA (0.42) LMNACES2CES1KDM4EALDH1A1
Benzoin SCHEMBL26111227 0.82 LMNA (0.66) LMNACES2CES1KDM4EALDH1A1
SCHEMBL27699434 0.81 LMNA (0.49) LMNACES2CES1KDM4EALDH1A1
SCHEMBL8207164 0.80 LMNA (0.61) LMNACES2CES1KDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110083010-A The manufacturing method of photosensitive polymer combination, photosensitive film, permanent resist and permanent resist 日立化成株式会社 2019-08-02 CN disclosed
CN-110058490-A The manufacturing method of photosensitive polymer combination, photosensitive film, permanent resist and permanent resist 日立化成株式会社 2019-07-26 CN disclosed