Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX1 | P07099 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1319365 | 0.87 | KEAP1 (0.33) | EPHX1 | |
| SCHEMBL214056 | 0.87 | KEAP1 (0.33) | EPHX1 | |
| SCHEMBL1155629 | 0.87 | KEAP1 (0.33) | EPHX1 | |
| SCHEMBL14777042 | 0.87 | KEAP1 (0.33) | EPHX1 | |
| SCHEMBL1412679 | 0.85 | KEAP1 (0.34) | — | |
| SCHEMBL5992830 | 0.79 | CYP1A2 (0.32) | — | |
| Methacrylic Acid SCHEMBL5669359 | 0.74 | ALDH1A1 (0.46) | EPHX1 | |
| SCHEMBL7155260 | 0.73 | — | — | |
| Methacrylic Acid SCHEMBL3292360 | 0.73 | EPHX1 (0.42) | EPHX1 | |
| Methacrylic Acid SCHEMBL3288616 | 0.73 | EPHX1 (0.42) | EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20040076906-A1 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. | 2004-04-22 | — | — | US | claimed |
| US-20030215742-A1 | Novel copolymers and photoresist compositions comprising same | BARCLAY GEORGE G (US) | 2003-11-20 | — | — | US | claimed |
| EP-1128213-A2 | Photoresist compositions comprising novel copolymers | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | claimed |
| EP-1091249-A1 | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | claimed |
| US-7700256-B2 | Phenolic/alicyclic copolymers and photoresists | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-04-20 | — | — | US | disclosed |
| US-7309750-B2 | Cyanoadamantyl compounds and polymers | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-12-18 | — | — | US | disclosed |
| US-7270935-B2 | Cyanoadamantyl compounds and polymers and photoresists comprising same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2007-09-18 | — | — | US | disclosed |
| US-7208261-B2 | Polymers, processes for polymer synthesis and photoresist compositions | SHIPLEY COMPANY, L.L.C. (US) | 2007-04-24 | — | — | US | disclosed |
| US-7105266-B2 | Polymers containing oxygen and sulfur alicyclic units and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2006-09-12 | — | — | US | disclosed |
| US-7090968-B2 | Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising same | SHIPLEY COMPANY, L.L.C. (US) | 2006-08-15 | — | — | US | disclosed |
| EP-1210650-A4 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY CO LLC (US) | 2006-05-03 | — | — | EP | disclosed |
| WO-2001086353-A9 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY CO LLC (US) | 2005-10-27 | — | — | WO | disclosed |
| WO-2002069038-A2 | NOVEL POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |
| WO-2002069040-A1 | NOVEL POLYMERS, PROCESSES FOR POLYMER SYNTHESIS AND PHOTORESIST COMPOSITIONS | SHIPLEY COMPANY, LLC (US) | 2002-09-06 | — | — | WO | disclosed |
| EP-1210650-A1 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | Shipley Company LLC (US) | 2002-06-05 | — | — | EP | disclosed |
| WO-2001086353-A1 | POLYMERS CONTAINING OXYGEN AND SULFUR ALICYCLIC UNITS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2001-11-15 | — | — | WO | disclosed |
| US-6306554-B1 | PHOTORESIST COMPOSITION COMPRISING PHOTOACTIVE COMPONENT AND POLYMER THAT COMPRISES A PHOTOACID-LABILE MOIETY AND STRUCTURE CONTAINING OXYGEN AND/OR SULFUR ALICYCLIC UNITS AND CARBON ALICYCLIC UNITS | SHIPLEY COMPANY, L.L.C. | 2001-10-23 | — | — | US | disclosed |
| EP-1128213-A2 | Photoresist compositions comprising novel copolymers | Shipley Company LLC (US) | 2001-08-29 | — | — | EP | disclosed |
| EP-1091249-A1 | Copolymers having nitride and alicyclic leaving groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |
| EP-1091250-A1 | Copolymers having phenol groups and alicyclic groups and photoresist compositions comprising same | Shipley Company LLC (US) | 2001-04-11 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030215742-A1 | Novel copolymers and photoresist compositions comprising same | LCP1, PUF60, MACF1 | EPHX1 3325/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.