Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFKB1 | P19838 | 1/20 | 0.37 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.37 |
| ▸ | RELA | Q04206 | 1/20 | 0.37 |
| ▸ | RECQL | P46063 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.31 |
| ▸ | CTSD | P07339 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.30 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.30 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.30 |
| ▸ | HTR2B | P41595 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL420045 | 0.77 | NFKB1 (0.37) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL22664175 | 0.74 | DHODH (0.33) | — | |
| Formaldehyde SCHEMBL1304276 | 0.74 | NFKB1 (0.36) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL27405297 | 0.73 | NFKB1 (0.38) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL28833044 | 0.73 | NFKB1 (0.34) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL27405844 | 0.73 | NFKB1 (0.34) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL31514269 | 0.73 | NFKB1 (0.38) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL27633331 | 0.73 | NFKB1 (0.38) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL28392491 | 0.73 | NFKB1 (0.35) | NFKB1NFKB2RELARECQLSMN1; SMN2 | |
| SCHEMBL10582988 | 0.73 | NFKB1 (0.32) | NFKB1NFKB2RELA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114008525-B | Method for producing purified resist composition, method for forming resist pattern, and purified resist composition | 东京应化工业株式会社 | 2025-05-23 | — | — | CN | disclosed |
| CN-119552505-A | Composition for producing porous film, method for producing porous film, and porous film | 东京应化工业株式会社 | 2025-03-04 | — | — | CN | disclosed |
| CN-119503513-A | Winding device, film winding method, and method for producing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-119503516-A | Slitting machine and system for manufacturing porous imide resin film | 东京应化工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-107249720-B | Method for purifying liquid, method for producing chemical liquid or cleaning liquid, filter medium, and filter device | 东京应化工业株式会社 | 2025-01-10 | — | — | CN | disclosed |
| CN-118440497-A | Composition for producing porous film, method for producing porous film, and porous film | 东京应化工业株式会社 | 2024-08-06 | — | — | CN | disclosed |
| CN-117839447-A | Porous film | 东京应化工业株式会社 | 2024-04-09 | — | — | CN | disclosed |
| CN-111378198-B | Method for producing porous film, method for producing composition for producing porous film, and porous film | 东京应化工业株式会社 | 2024-01-12 | — | — | CN | disclosed |
| CN-117202984-A | Polyimide porous film | 东京应化工业株式会社 | 2023-12-08 | — | — | CN | disclosed |
| CN-116457394-A | Varnish for producing polyimide porous film | 东京应化工业株式会社 | 2023-07-18 | — | — | CN | disclosed |
| CN-113717428-A | Method for producing porous film | 东京应化工业株式会社 | 2021-11-30 | — | — | CN | disclosed |
| CN-106552517-B | Barrier filter, method for filtering, method for producing purified product of liquid chemical for lithography, and method for forming resist pattern | 东京应化工业株式会社 | 2021-10-26 | — | — | CN | disclosed |
| CN-107207760-B | Polyimide and/or polyamideimide porous body, and method for producing same and use thereof | 东京应化工业株式会社 | 2021-03-16 | — | — | CN | disclosed |
| CN-112111219-A | Varnish composition, precursor film of polyimide porous film, method for producing precursor film of polyimide porous film, and method for producing polyimide porous film | 东京应化工业株式会社 | 2020-12-22 | — | — | CN | disclosed |
| CN-110382097-B | Asymmetric membrane | 三菱瓦斯化学株式会社 | 2020-07-07 | — | — | CN | disclosed |
| CN-111378198-A | Method for producing porous film, method for producing composition for producing porous film, and porous film | 东京应化工业株式会社 | 2020-07-07 | — | — | CN | disclosed |
| CN-110951104-A | Heat treatment apparatus, imide resin film production system, and heat treatment method | 东京应化工业株式会社 | 2020-04-03 | — | — | CN | disclosed |
| CN-110828748-A | Imide resin film production system, imide resin film production method, and separator | 东京应化工业株式会社 | 2020-02-21 | — | — | CN | disclosed |
| CN-106661262-B | Porous imide resin film production system, separator, and porous imide resin film production method | 东京应化工业株式会社 | 2020-01-21 | — | — | CN | disclosed |
| CN-106661265-B | Varnish for producing porous polyimide film, and method for producing porous polyimide film using same | 东京应化工业株式会社 | 2019-12-17 | — | — | CN | disclosed |